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Negative differential resistance with high peak-to-valley ratio via subband resonant tunneling of Γ-valley carriers in WSe<sub>2</sub>/h-BN/WSe<sub>2</sub> junctions

ORAL

Abstract

Resonant tunneling diodes (RTDs) exhibit negative differential resistance (NDR) in current-voltage characteristics, which is important in various device applications including high-frequency and logic circuits. In this study, we explore a range of WSe2/h-BN/WSe2 RTD devices by varying the number of layers of WSe2, and observe the highest peak-to-valley ratio (PVR) values of 63.6 at 2 K and 16.2 at 300 K with source 3-layer (3L) WSe2 and drain 1-layer (1L) WSe2. These PVR values are the highest ever reported for RTDs based on two-dimensional (2D) materials. Traditionally, RTDs were realized in III-V semiconductor superlattices, but high-performance RTDs based on 2D materials have been long awaited. Our findings highlight two key conditions for achieving high PVR: 1) resonant tunneling should occur between the Γ-point bands of the source and drain WSe2, and 2) the Γ-point bands contributing to the resonant tunneling should be energetically separated from the other bands. These insights mark a significant step towards surpassing the performance of III-V semiconductor RTDs using 2D materials.

Presenters

  • Kei Kinoshita

    Univ of Tokyo

Authors

  • Kei Kinoshita

    Univ of Tokyo

  • Rai Moriya

    The University of Tokyo, Univ of Tokyo, Institute of Industrial Science, University of Tokyo

  • Seiya Kawasaki

    Univ of Tokyo

  • Shota Okazaki

    Science Tokyo

  • Momoko Onodera

    Univ of Tokyo

  • Yijin Zhang

    The University of Tokyo, Univ of Tokyo

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Functional Materials, National Institute for Materials Science, Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan, National Institute of Materials Science, Advanced Materials Laboratory, National Institute for Materials Science

  • Takashi Taniguchi

    National Institute for Materials Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan, Advanced Materials Laboratory, National Institute for Materials Science

  • Takao Sasagawa

    Science Tokyo, Institute of Science Tokyo, Tokyo Inst of Tech - Yokohama

  • Tomoki Machida

    The University of Tokyo, Institute of Industrial Science, The University of Tokyo, Univ of Tokyo, Institute of Industrial Science, University of Tokyo