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Optical Properties of Acceptor Impurities in Ga<sub>2</sub>O<sub>3</sub>

ORAL

Abstract

Ga2O3 has attracted great attention as a promising material for high power electronic applications due to a very large band gap, high breakdown voltage and ability to be doped n-type. The Ga2O3 Baliga’s figure of merit is only lower than that of diamond. Most importantly, large single crystals of Ga2O3 are available, facilitating epitaxial growth. Although p-type Ga2O3 have not been demonstrated as acceptor impurities tend to introduce deep acceptor levels, they can be used to make semi-insulating layers, and that can be useful in device designing. The deep levels of acceptor impurities in ultra-wide-band gap oxides are often difficult to probe experimentally. To facilitate the experimental characterization of the acceptor impurities, we employed hybrid density-functional calculations to investigate the optical transitions of acceptor impurities in monoclinic Ga2O3. We constructed configuration coordinate diagrams to determine the absorption and emission energies that can be compared with the optical absorption and photoluminescence measurements. The results show that all impurities exhibit deep acceptor transitions. The calculated emission energies are compared with the available experiment data.

Presenters

  • Intuon Chatratin

    Department of Materials Science & Engineering, University of Delaware

Authors

  • Intuon Chatratin

    Department of Materials Science & Engineering, University of Delaware

  • Fernando Sabino

    Department of Materials Science & Engineering, University of Delaware, Department of Material Science and Engineering, University of Delaware

  • Pakpoom Reunchan

    Department of Physics, Kasetsart University

  • Anderson Janotti

    Materials Science and Engineering, University of Delaware, Department of Materials Science and Engineering, University of Delaware, University of Delaware, Department of Materials Science & Engineering, University of Delaware, Department of Material Science and Engineering, University of Delaware, Univ of Delaware