Industrial-Driven Innovations in RF Power Systems

Recent advances in semiconductor manufacturing have introduced complex plasma processes that require highly flexible RF power delivery. Traditional systems using 2-level pulse outputs and discrete impedance matching have limitations in speed and efficiency. To overcome these challenges, we propose an integrated RF system that enables 8-level pulse waveform control and ultra-fast impedance matching using a newly developed Quantum-Plus Matching algorithm. The proposed integrated RF system demonstrates significant advancement in speed, efficiency, and adaptability. By merging waveform control with real-time impedance matching under a unified controller, this platform addresses key industrial challenges in advanced plasma processing. Future work will explore AI-driven optimization and multi-frequency expansion.