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Workshop: Industrial Applications of Plasma Technology to Microelectronics

INVITED · GM2 · ID: 3430304

Presentations

  • Study of Plasma Characteristics Using Tailored Pulse DC Bias

    ORAL · Invited

    –

    Presenters

    • Jong Sik Kim

      Korea Institute of Fusion Energy(KFE), KFE, Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

    Authors

    • Jong Sik Kim

      Korea Institute of Fusion Energy(KFE), KFE, Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

    • Sung-Roc JANG

      Korea Electrotechnology Research Institute(KERI)

    • Yonghyun Kim

      Korea Institute of Fusion Energy(KFE), KFE, Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea, Korea Institute of Fusion Energy

    • Dae-Chul Kim

      Korea Institute of Fusion Energy(KFE), Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

    • SANGHYEOK PARK

      Korea Institute of Fusion Energy(KFE), Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

    • Jongbae PARK

      Korea Institute of Fusion Energy(KFE)

    • Jonghyun SHIN

      Korea Institute of Fusion Energy(KFE)

    • Young-Woo KIM

      Korea Institute of Fusion Energy(KFE)

    • Jung-Sik YOON

      Korea Institute of Fusion Energy(KFE)

    View abstract →

  • Electron power absorption dynamics in capacitive RF plasmas: from fundamental understanding to process-relevant parameter control

    ORAL · Invited

    –

    Presenters

    • Li Wang

      Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany, Ruhr University Bochum

    Authors

    • Li Wang

      Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany, Ruhr University Bochum

    • Aranka Derzsi

      HUN-REN Wigner Research Centre for Physics, Budapest, Hungary, Wigner Research Center for Physics

    • Peter Hartmann

      HUN-REN Wigner Research Centre for Physics, Budapest, Hungary, Wigner Research Centre for Physics, Hungary

    • Zoltan Donko

      HUN-REN Wigner Research Centre for Physics, Budapest, Hungary, Institute for Solid State Physics and Optics, HUN-REN Wigner Research Centre for Physics, Wigner Research Center for Physics

    • Maximilian Ryppa

      Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Constantin Neuroth

      Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany, Ruhr-University Bochum

    • Florian Beckfeld

      Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    • Yuanhong Song

      School of Physics, Dalian University of Technology, Dalian, China, Dalian University of Technology, Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian

    • Julian Schulze

      Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

    View abstract →