Workshop: Industrial Applications of Plasma Technology to Microelectronics

Presentations

• Ion and Radical control technologies for the next generation seminconductor fabrication

  ORAL · Invited

  Oct. 12, 2025, 9:00 PM – Oct. 12, 2025, 9:30 PM

  Presenters

  • Jong Chul Park

    Samsung Electronics R&D Centre

  Authors

  • Jong Chul Park

    Samsung Electronics R&D Centre

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• Challenges and Approaches of High Aspect Ratio Contact Patterning for Memory Devices

  ORAL · Invited

  Oct. 12, 2025, 9:30 PM – Oct. 12, 2025, 10:00 PM

  Presenters

  • Yeonghun Han

    SK hynix Inc.

  Authors

  • Yeonghun Han

    SK hynix Inc.

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• Material Modification and Selective Removal Process for incoming logic and memory device

  ORAL · Invited

  Oct. 12, 2025, 10:00 PM – Oct. 12, 2025, 10:30 PM

  Presenters

  • Jin Chul Son

    PSK

  Authors

  • Jin Chul Son

    PSK

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• Study of Plasma Characteristics Using Tailored Pulse DC Bias

  ORAL · Invited

  Oct. 12, 2025, 10:30 PM – Oct. 12, 2025, 11:00 PM

  Presenters

  • Jong Sik Kim

    Korea Institute of Fusion Energy(KFE), KFE, Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

  Authors

  • Jong Sik Kim

    Korea Institute of Fusion Energy(KFE), KFE, Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

  • Sung-Roc JANG

    Korea Electrotechnology Research Institute(KERI)

  • Yonghyun Kim

    Korea Institute of Fusion Energy(KFE), KFE, Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea, Korea Institute of Fusion Energy

  • Dae-Chul Kim

    Korea Institute of Fusion Energy(KFE), Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

  • SANGHYEOK PARK

    Korea Institute of Fusion Energy(KFE), Plasma Equipment Intelligence Convergence Research Center, Korea Institute of Fusion Energy, Korea

  • Jongbae PARK

    Korea Institute of Fusion Energy(KFE)

  • Jonghyun SHIN

    Korea Institute of Fusion Energy(KFE)

  • Young-Woo KIM

    Korea Institute of Fusion Energy(KFE)

  • Jung-Sik YOON

    Korea Institute of Fusion Energy(KFE)

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• Lunch

  COFFEE_KLATCH

  Oct. 12, 2025, 11:00 PM – Oct. 13, 2025, 12:30 AM

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• Industrial-Driven Innovations in RF Power Systems

  ORAL · Invited

  Oct. 13, 2025, 12:30 AM – Oct. 13, 2025, 1:00 AM

  Presenters

  • Ki Chul Um

    Advanced Semiconductor Engineering

  Authors

  • Ki Chul Um

    Advanced Semiconductor Engineering

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• Challenges and solutions for fine pitch high aspect ratio patterning in sub-10nm DRAM device

  ORAL · Invited

  Oct. 13, 2025, 1:00 AM – Oct. 13, 2025, 1:30 AM

  Presenters

  • Kukhan Yoon

    Samsung Electronics

  Authors

  • Kukhan Yoon

    Samsung Electronics

  • Woohyun Lee

    Samsung Electronics

  • Chanhoon Park

    Samsung Electronics

  • Jongkyu Kim

    Samsung Electronics

  • Keumjoo Lee

    Samsung Electronics

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• Opportunities and Challenges at the Edge of Scaling in Advanced Memory and Foundry Technologies

  ORAL · Invited

  Oct. 13, 2025, 1:30 AM – Oct. 13, 2025, 2:00 AM

  Presenters

  • Sangwuk Park

    Samsung Electronics

  Authors

  • Sangwuk Park

    Samsung Electronics

  • Jinwoo Han

    Samsung Electronics

  • Daewon Ha

    Samsung Electronics

  • Seunghun Lee

    Samsung Electronics

  • Jinkwan Lee

    Samsung Electronics

  • Janghee Lee

    Samsung Electronics

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• AI-based plasma density estimation using MAHA sensor

  ORAL · Invited

  Oct. 13, 2025, 2:00 AM – Oct. 13, 2025, 2:30 AM

  Presenters

  • Kisuk Sung

    RTM

  Authors

  • Kisuk Sung

    RTM

  • Heelang Ryu

    RTM

  • Seungheui Lee

    RTM

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• Coffee Break

  COFFEE_KLATCH

  Oct. 13, 2025, 2:30 AM – Oct. 13, 2025, 3:00 AM

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• The industrial application of remote plasma sources as an enabling technology for 3D semiconductor fabrications

  ORAL · Invited

  Oct. 13, 2025, 3:00 AM – Oct. 13, 2025, 3:30 AM

  Presenters

  • Jang-Gyoo Yang

    WONIK IPS

  Authors

  • Tae S Cho

    Wonik IPS

  • Jang-Gyoo Yang

    WONIK IPS

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• Electron power absorption dynamics in capacitive RF plasmas: from fundamental understanding to process-relevant parameter control

  ORAL · Invited

  Oct. 13, 2025, 3:30 AM – Oct. 13, 2025, 4:00 AM

  Presenters

  • Li Wang

    Ruhr University Bochum, Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  Authors

  • Li Wang

    Ruhr University Bochum, Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  • Aranka Derzsi

    Wigner Research Center for Physics, HUN-REN Wigner Research Centre for Physics, Budapest, Hungary

  • Peter Hartmann

    Wigner Research Centre for Physics, Hungary, HUN-REN Wigner Research Centre for Physics, Budapest, Hungary

  • Zoltan Donko

    Wigner Research Center for Physics, HUN-REN Wigner Research Centre for Physics, Budapest, Hungary, Institute for Solid State Physics and Optics, HUN-REN Wigner Research Centre for Physics

  • Maximilian Ryppa

    Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  • Constantin Neuroth

    Ruhr-University Bochum, Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  • Florian Beckfeld

    Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

  • Yuanhong Song

    Dalian University of Technology, School of Physics, Dalian University of Technology, Dalian, China, Key Laboratory of Materials Modification by Laser, Ion, and Electron Beams (Ministry of Education), School of Physics, Dalian University of Technology, Dalian

  • Julian Schulze

    Chair of Applied Electrodynamics and Plasma Technology, Ruhr University Bochum, Bochum, Germany

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