Deposition of Rutile TiO<sub>2</sub> Thin Films Using high power pulsed magnetron sputtering
ORAL
Abstract
Rutile TiO2 can be used for optical glass and capacitor due to feature of high refractive index and high permittivity, respectively. Generally, substrate heating or annealing after the deposition is required to obtain rutile TiO2. In the present study, high power pulsed magnetron sputtering (HPPMS) was used for depositing rutile TiO2 without substrate heating. HPPMS allows to generate high density plasma resulting in providing kinetic energy by ions bombardment.
TiO2 was synthesized while changing voltage which is applied to titanium target.
The working pressure was fixed to 3 Pa. The flow rates were 10 sccm, for Ar and O2 respectively ensuring a constant ratio O2/(Ar+O2) of 30%. The films were deposited. The pulse frequency and the pulse width were set at 500 Hz and 29 µs, respectively.
The X-ray diffraction (XRD) pattern corresponding to the sample grown at 550V exhibited an intense (101) anatase peak at the angle of 25.3°. For samples grown at 600V, However, intensity peaks appeared at 27.9° and 38.6°which are attributed to the rutile(110) and anatase (112) peaks, respectively. For sample grown at 670V, (110) peak clearly appeared, while the (101) and (112) peaks were absent. Anatase to rutile phase transformation occurs by ion bombardment.
TiO2 was synthesized while changing voltage which is applied to titanium target.
The working pressure was fixed to 3 Pa. The flow rates were 10 sccm, for Ar and O2 respectively ensuring a constant ratio O2/(Ar+O2) of 30%. The films were deposited. The pulse frequency and the pulse width were set at 500 Hz and 29 µs, respectively.
The X-ray diffraction (XRD) pattern corresponding to the sample grown at 550V exhibited an intense (101) anatase peak at the angle of 25.3°. For samples grown at 600V, However, intensity peaks appeared at 27.9° and 38.6°which are attributed to the rutile(110) and anatase (112) peaks, respectively. For sample grown at 670V, (110) peak clearly appeared, while the (101) and (112) peaks were absent. Anatase to rutile phase transformation occurs by ion bombardment.
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Presenters
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Miyuki Nishimura
Meijo University
Authors
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Miyuki Nishimura
Meijo University
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Takayuki Ohta
Meijo Univ, Meijo University, Shiogamaguchi 1-501, Tenpaku-ku, Nagoya 468-8502, Japan., Department of Electrical and Electronic Engineering, Meijo University, Japan, Department of Electrical and Electronic Engineering, Meijo University, Japan., Meijo university, Meijo University, Department of Electrical and Electronic Engineering, Meijo Universiry, Japan