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Plasma Deposition

FOCUS · GF3 · ID: 550050





Presentations

  • Process analysis of cracking a-C:H/CNP/a-C:H sandwich films under stress using nanoindentation

    ORAL

    Presenters

    • Shinjiro Ono

      Kyushu University

    Authors

    • Shinjiro Ono

      Kyushu University

    • Takamasa Okumura

      Kyushu University, Kyushu University, Japan

    • Kunihiro Kamataki

      Kyushu Univ, Kyushu University, Kyushu University, Japan

    • Naoto Yamashita

      Kyushu University, Kyushu University, Japan

    • Naho Itagaki

      Kyushu University, Kyushu University, Japan

    • Kazunori Koga

      Kyushu Univ, Kyushu University, Kyushu University, Japan

    • Masaharu Shiratani

      Kyushu University, Kyushu University, Japan

    View abstract →

  • Deposition of zinc oxide film using high power impulse magnetron sputtering

    ORAL

    Presenters

    • Katsunori Nagahashi

      Department of Electrical and Electronic Engineering, Meijo Universiry, Japan

    Authors

    • Katsunori Nagahashi

      Department of Electrical and Electronic Engineering, Meijo Universiry, Japan

    • Takayuki Ohta

      Meijo Univ, Meijo University, Shiogamaguchi 1-501, Tenpaku-ku, Nagoya 468-8502, Japan., Department of Electrical and Electronic Engineering, Meijo University, Japan, Department of Electrical and Electronic Engineering, Meijo University, Japan., Meijo university, Meijo University, Department of Electrical and Electronic Engineering, Meijo Universiry, Japan

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  • Sputter epitaxy of Mg-doped ZnO films on sapphire substrates using inverted Stranski-Krastanov mode

    ORAL

    Publication: D. Takahashi, et al., MRS Advances, https://doi.org/10.1557/s43580-022-00234-1

    Presenters

    • Masaharu Shiratani

      Kyushu University, Kyushu University, Japan

    Authors

    • Masaharu Shiratani

      Kyushu University, Kyushu University, Japan

    • Daichi Takahashi

      Kyushu University

    • Naoto Yamashita

      Kyushu University, Kyushu University, Japan

    • Naho Itagaki

      Kyushu University

    View abstract →

  • Deposition of Rutile TiO<sub>2</sub> Thin Films Using high power pulsed magnetron sputtering

    ORAL

    Presenters

    • Miyuki Nishimura

      Meijo University

    Authors

    • Miyuki Nishimura

      Meijo University

    • Takayuki Ohta

      Meijo Univ, Meijo University, Shiogamaguchi 1-501, Tenpaku-ku, Nagoya 468-8502, Japan., Department of Electrical and Electronic Engineering, Meijo University, Japan, Department of Electrical and Electronic Engineering, Meijo University, Japan., Meijo university, Meijo University, Department of Electrical and Electronic Engineering, Meijo Universiry, Japan

    View abstract →