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Tuning the Ion Energy Distribution by Tailored Low-frequency Voltage Waveforms in CCPs

ORAL

Abstract

In a wide range of plasma-assisted surface modification technologies, the tuning of the flux energy distribution of the positive ion species (IFED) is of key importance in order to control the desired process. Low-pressure CCPs, characterized by a collisionless electrode sheath, utilizing multi-frequency Tailored Voltage Waveforms can be used to control the energy of the impacting ions separately from the ion flux. We present experimental IFED and DC bias voltage data, accompanied by detailed 1D and 2D PIC/MCC simulation results of argon discharges driven with tailored, pulsed, low-frequency (100 kHz) voltage waveforms in combination with a 27.1 MHz high-frequency power signal. Detailed insights into the operation, DC self-bias formation, sheath dynamics, electron, and ion acceleration processes are provided.

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Presenters

  • Peter Hartmann

    Wigner Research Center for Physics & Baylor University, Wigner Research Center for Physics, Budapest, Hungary, Wigner Research Center for Physics and Baylor University, Wigner Research Center for Physics

Authors

  • Peter Hartmann

    Wigner Research Center for Physics & Baylor University, Wigner Research Center for Physics, Budapest, Hungary, Wigner Research Center for Physics and Baylor University, Wigner Research Center for Physics

  • Ihor Korolov

    Ruhr Univ Bochum, Institute of Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany, Ruhr-Universität Bochum, Germany, Ruhr University Bochum, Bochum University, Ruhr Univ Bochum, Germany, Ruhr-University Bochum, Ruhr-University Bochum, Germany

  • Julian Schulze

    Ruhr University Bochum, Institute of Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany, Ruhr Univ Bochum, Ruhr-University Bochum, Germany; Dalian University of Technology, China, Ruhr University Bochum, Dalian University of Technology, Ruch Univ Bochum, Germany, Ruhr-University Bochum

  • Wouter van Gennip

    Prodrive Technologies, Eindhoven, The Netherlands

  • Koen Buskes

    Prodrive Technologies, Eindhoven, The Netherlands