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Capacitively Coupled Plasmas I

FOCUS · DT21 · ID: 14015

Presentations

  • Ion Energy and Density Profile Control by Focus Ring and Associated External Circuit on Capacitively Coupled Plasma

    ORAL

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    Presenters

    • Yuhua Xiao

      North Carolina State University

    Authors

    • Yuhua Xiao

      North Carolina State University

    • Joel Brandon

      North Carolina State University

    • Sang Ki Nam

      Samsung Electronics, Samsung Mechatronics R&D center, Samsung Mechatronics R&D Center, Samsung Electronics Co.

    • Kiho Bae

      Samsung Mechatronics R&D Center

    • Jang-Yeob Lee

      Samsung Mechatronics R&D Center

    • Steven Shannon

      North Carolina State University

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  • Frequency effects on nonlinear harmonic excitations in an asymmetrically-driven capacitive discharge

    ORAL

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    Presenters

    • Jian-Kai Liu

      Dalian University of Technology; University of California, Berkeley

    Authors

    • Jian-Kai Liu

      Dalian University of Technology; University of California, Berkeley

    • Emi Kawamura

      University of California, Berkeley

    • Michael A Lieberman

      University of California, Berkeley

    • Allan J Lichtenberg

      University of California, Berkeley

    • You-Nian Wang

      School of Physics, Dalian University of Technology, Dalian 116024, People's Republic of China, Dalian University of Technology

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  • On the Similarity and Scaling Laws in Low-Pressure Capacitive Radio Frequency Discharges

    ORAL

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    Publication: [1]. Yangyang Fu, Bocong Zheng*, De-Qi Wen, Peng Zhang, Qi Hua Fan, and John P. Verboncoeur, "Similarity law and frequency scaling in low-pressure capacitive radio frequency plasmas", Appl. Phys. Lett. 117, 204101 (2020).<br>[2]. Yangyang Fu, Bocong Zheng, Peng Zhang, Qi Hua Fan, John P. Verboncoeur, and Xinxin Wang, "Similarity of capacitive radio frequency discharges in nonlocal regimes", Phys. Plasmas 27, 113501 (2020).<br>[3]. Yangyang Fu, Bocong Zheng, De-Qi Wen, Peng Zhang, Qi Hua Fan, and John P. Verboncoeur, "High-energy ballistic electrons in low-pressure radio-frequency plasmas", Plasma Sources Sci. Technol. 29, 09LT01 (2020).

    Presenters

    • Yangyang Fu

      Tsinghua University

    Authors

    • Yangyang Fu

      Tsinghua University

    • Bocong Zheng

      Fraunhofer USA, Fruahnhofer Institute, Michigan State University

    • Huihui Wang

      Tsinghua University

    • Peng Zhang

      Michigan State University

    • Qi Hua Fan

      Michigan State University

    • Xinxin Wang

      Tsinghua University

    • John P. Verboncoeur

      Michigan State University

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  • 2D PIC simulations of geometrically asymmetric capacitive RF plasmas driven by tailored voltage waveforms

    ORAL · Invited

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    Publication: Li Wang et al 2021 Plasma Sources Sci. Technol. 30 054001

    Presenters

    • Li Wang

      Ruhr University Bochum & Dalian University of Technology, Ruhr University Bochum and Dalian University of Technology

    Authors

    • Li Wang

      Ruhr University Bochum & Dalian University of Technology, Ruhr University Bochum and Dalian University of Technology

    • Peter Hartmann

      Wigner Research Center for Physics & Baylor University, Wigner Research Center for Physics, Budapest, Hungary, Wigner Research Center for Physics and Baylor University, Wigner Research Center for Physics

    • Zoltan Donko

      Institute for Solid State Physics and Optics, Wigner Research Center for Physics, Hungary, Wigner Research Center for Physics, Wigner Research Centre for Physics, Wigner Research Center

    • Yuan-Hong Song

      Dalian University of Technology

    • Julian Schulze

      University of Bochum, Germany, Ruhr-Universität Bochum, Germany, Ruhr Univ Bochum, Bochum University, Ruhr University Bochum & Dalian University of Technology, Ruhr University Bochum, 44780 Bochum, Germany, Ruhr University Bochum, Ruhr University Bochum and Dalian University of Technology, Ruhr-University Bochum, Germany; Dalian University of Technology, China

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  • Tuning the Ion Energy Distribution by Tailored Low-frequency Voltage Waveforms in CCPs

    ORAL

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    Presenters

    • Peter Hartmann

      Wigner Research Center for Physics & Baylor University, Wigner Research Center for Physics, Budapest, Hungary, Wigner Research Center for Physics and Baylor University, Wigner Research Center for Physics

    Authors

    • Peter Hartmann

      Wigner Research Center for Physics & Baylor University, Wigner Research Center for Physics, Budapest, Hungary, Wigner Research Center for Physics and Baylor University, Wigner Research Center for Physics

    • Ihor Korolov

      Ruhr Univ Bochum, Institute of Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany, Ruhr-Universität Bochum, Germany, Ruhr University Bochum, Bochum University, Ruhr Univ Bochum, Germany, Ruhr-University Bochum, Ruhr-University Bochum, Germany

    • Julian Schulze

      Ruhr University Bochum, Institute of Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany, Ruhr Univ Bochum, Ruhr-University Bochum, Germany; Dalian University of Technology, China, Ruhr University Bochum, Dalian University of Technology, Ruch Univ Bochum, Germany, Ruhr-University Bochum

    • Wouter van Gennip

      Prodrive Technologies, Eindhoven, The Netherlands

    • Koen Buskes

      Prodrive Technologies, Eindhoven, The Netherlands

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  • The effects of surface processes on the plasma parameters in low-pressure multi-frequency capacitive discharges

    ORAL

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    Presenters

    • Aranka Derzsi

      Wigner Research Centre for Physics, Hungary, Wigner Research Centre for Physics, Hung

    Authors

    • Aranka Derzsi

      Wigner Research Centre for Physics, Hungary, Wigner Research Centre for Physics, Hung

    • Benedek Horvath

      Wigner Research Center for Physics

    • Zoltan Donko

      Institute for Solid State Physics and Optics, Wigner Research Center for Physics, Hungary, Wigner Research Center for Physics, Wigner Research Centre for Physics, Wigner Research Center

    • Julian Schulze

      Ruhr University Bochum, Institute of Electrical Engineering and Plasma Technology, Faculty of Electrical Engineering and Information Technology, Ruhr-University Bochum, Germany, Ruhr Univ Bochum, Ruhr-University Bochum, Germany; Dalian University of Technology, China, Ruhr University Bochum, Dalian University of Technology, Ruch Univ Bochum, Germany, Ruhr-University Bochum

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  • Structural and Electrical Methods for Enhancing Homogeneity in Intermediate Pressure Capacitively Coupled Plasma Processing Sources

    ORAL

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    Presenters

    • Scott J Doyle

      Department of Atomic, Molecular and Nuclear Physics, University of Seville, Avda. Reina Mercedes, E-41012 Seville, Spain, Universidad de Sevilla

    Authors

    • Scott J Doyle

      Department of Atomic, Molecular and Nuclear Physics, University of Seville, Avda. Reina Mercedes, E-41012 Seville, Spain, Universidad de Sevilla

    • Gregory J Smith

      York Plasma Institute, Department of Physics, University of York, Heslington, York, YO10 5DD, UK, University of York

    • Gregory Daly

      Oxford Instruments Plasma Technology

    • Geoff Hassall

      Oxford Instruments Plasma Technology

    • James P Dedrick

      York Plasma Institute, Department of Physics, University of York, Heslington, York, YO10 5DD, UK, University of York

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  • Electron power absorption in radio frequency driven capacitively coupled chlorine discharge

    ORAL

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    Publication: [1] A Proto and J T Gudmundsson, Plasma Sources Sci. Technol. 30 (2021) 065009<br>[2] G A Skarphedinsson1 and J T Gudmundsson, Plasma Sources Sci. Technol. 29 (2020) 084004

    Presenters

    • Jon T Gudmundsson

      Science Institute, University of Iceland, Reykjavik, Iceland, Univ of Iceland

    Authors

    • Jon T Gudmundsson

      Science Institute, University of Iceland, Reykjavik, Iceland, Univ of Iceland

    • Andrea Proto

      University of Iceland

    • Gardar A Skarphedinsson

      University of Iceland

    View abstract →