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Progress in Graphene Quantum Hall Array Resistance Standards

ORAL

Abstract

Epitaxial graphene (EG) on silicon carbide is the superior material for quantum Hall array resistance standard (QHARS) because both the synthesis of EG and fabrication of quantum Hall array based on EG is scalable. I will discuss the recent progress in development of QHARS at NIST, including the synthesis of high-quality EG at centimeter scale, the fabrication of quantum Hall array consisting of hundreds of graphene Hall bars, as well as the precision measurement of graphene QHARS from 100 Ω to 1 GΩ.

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Presenters

  • Yanfei Yang

    National Institute of Standards and Technology (NIST)

Authors

  • Yanfei Yang

    National Institute of Standards and Technology (NIST)

  • Wei-Chen Lin

    National Taiwan University

  • Marta Musso

    Politecnico di Torino, Polytechnic University of Turin

  • Dean G Jarrett

    National Institute of Standards and Technology, NIST

  • Alireza R Panna

    National Institute of Standards and Technology, NIST, National Institute of Standards and Technology (NIST)

  • Ngoc Thanh Mai Tran

    University of Maryland College Park, University of Maryland, Joint Quantum Institute, University of Maryland

  • Albert F Rigosi

    National Institute of Standards and Technology, Physical Measurement Laboratory, National Institute of Standards and Technology, National Institute of Standards and Technology (NIST)

  • Frank C Seifert

    National Institute of Standards and Technology

  • Massimo Ortolano

    Politecnico di Torino, Polytechnic University of Turin

  • Kristen L Steffens

    National Institute of Standards and Technology

  • Cheng-Hsueh Yang

    National Taiwan University

  • Chi-Te Liang

    National Taiwan University

  • David B Newell

    National Institute of Standards and Technology

  • Randolph E Elmquist

    National Institute of Standards and Technology

  • Haddad Darine

    National Institute of Standards andTechnology