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Spin coherence of Er<sup>3+ </sup>in CeO<sub>2</sub> thin film on Silicon at sub-kelvin temperatures

ORAL

Abstract

Erbium ions (Er3+) are promising spin defects for telecom spin-photon interface as quantum memories for quantum communication networks. To this end, we have explored Er3+: CeO2 (cerium dioxide) thin film epitaxially grown on silicon [1,2] as a new CMOS-compatible platform with near-zero nuclear spin environment critical for supporting long-lived spins [3]. This platform has shown promising narrow optical homogeneous linewidth (~440KHz) with a spin relaxation time of ~2.5ms and a spin coherence of ~0.66μs at 3.6K [2]. Here, we report on our studies on Er3+ spin coherence at 15-300mK utilizing on-chip low-impedance 2D superconducting microwave resonator. The design enables an ensemble spin coupling strength ~2MHz with ~4x105 spins for on-chip ESR (electron spin resonance) studies. We find that Er3+ has a spin coherence up to ~180𝜇s at 15mK. We combine experimental data using both 2-pulse and 3-pulse Hahn-echo along with dynamical decoupling sequences and CCE (cluster-correlation expansion) based simulation to explore dominating dephasing processes. These studies point to possible approaches to improve Er3+ spin coherence and the potential of Er3+:CeO2 qubit systems for quantum networks and communication applications.

[1] G. Grant, et al. APL Mater. 12, 021121 (2024).

[2] J. Zhang, et al. npj Quantum Information, in press (2024); arXiv:2309.16785 (2023).

[3] S. Kanai, et al. PNAS. 119, e2121808119 (2022).

Presenters

  • Sagar Kumar Seth

    University of Chicago

Authors

  • Sagar Kumar Seth

    University of Chicago

  • Aneesh Bapat

    The University of Chicago

  • Jonah Nagura

    University of Chicago

  • Vrindaa Somjit

    Argonne National Laboratory

  • Xinhao Li

    Argonne National Laboratory

  • Gregory D Grant

    University of Chicago, University of Chicago / Argonne National Laboratory

  • Ignas Masiulionis

    University of Chicago

  • Dafei Jin

    Argonne National Laboratory

  • Xu Han

    Argonne National Laboratory

  • F. Joseph Heremans

    Argonne Nantional Lab, Materials Science Division and X-ray Science Division, Argonne National Laboratory, Argonne National Laboratory, Argonne National Lab, University of Chicago

  • Giulia Galli

    University of Chicago

  • David D Awschalom

    University of Chicago, Pritzker School of Molecular Engineering and Department of Physics, University of Chicago, Chicago, IL, USA, Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA., Pritzker School of Molecular Engineering, University of Chicago, Chicago, IL 60637, USA, Argonne National Laboratory

  • Supratik Guha

    Argonne National Laboratory

  • Jiefei Zhang

    Argonne National Laboratory