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Light-induced reorientation transition in an antiferromagnetic semiconductor

ORAL

Abstract

Due to the lack of a net magnetic moment, antiferromagnets possess a unique robustness to external magnetic fields and are thus predicted to play an important role in future magnetic technologies. However, this robustness also makes them quite difficult to control, and the development of novel methods to manipulate these systems with external stimuli is a fundamental goal of antiferromagnetic spintronics. In this work, we report evidence for a metastable reorientation of the order parameter in an antiferromagnetic semiconductor triggered by an ultrafast quench of the equilibrium order via photoexcitation above the band gap. The metastable state forms less than 10 ps after the excitation pulse, and persists for longer than 150 ps before decaying to the ground state via thermal fluctuations. Importantly, this transition cannot be induced thermodynamically, and requires the system to be driven out of equilibrium. Broadly speaking, this phenomenology is ultimately the result of large magnetoelastic coupling in combination with a relatively low symmetry of the magnetic ground state. Since neither of these properties are particularly uncommon in magnetic materials, the observations presented here imply a generic path toward novel device technology enabled by ultrafast dynamics in antiferromagnets.

Presenters

  • Bryan T Fichera

    Argonne National Laboratory

Authors

  • Bryan T Fichera

    Argonne National Laboratory

  • Baiqing Lv

    Shanghai Jiao Tong University

  • Karna Morey

    Stanford University

  • Zongqi Shen

    Massachusetts Institute of Technology

  • Changmin Lee

    Lawrence Berkeley National Laboratory

  • Elizabeth Donoway

    University of California, Berkeley

  • Alexander Liebman-pelaez

    University of California, Berkeley

  • Anshul Kogar

    University of California, Los Angeles, UCLA

  • Takashi Kurumaji

    California Institute of Technology

  • Martin A Rodriguez-vega

    American Physical Society (APS)

  • Rodrigo H Aguilera-del-Toro

    DIPC

  • Mikel Arruabarrena Larrarte

    Centro de Física de Materiales-MPC (CSIC-UPV/EHU)

  • Batyr Ilyas

    Massachusetts Institute of Technology, University of California Berkeley

  • Tianchuang Luo

    Massachusetts Institute of Technology

  • Peter Muller

    MIT

  • Aritz Leonardo

    University of the Basque Country UPV/EHU

  • Andres Ayuela

    Centro de Fí­sica de Materiales-MPC (CSIC-UPV/EHU)

  • Gregory A Fiete

    Northeastern University

  • Joseph G Checkelsky

    Massachusetts Institute of Technology

  • Joseph W Orenstein

    University of California, Berkeley

  • Nuh Gedik

    Massachusetts Institute of Technology