Oral: Impact of post-fabrication cleaning on loss mechanisms in wet-etched aluminum-based superconducting resonators

High-quality superconducting resonators are crucial for advancing quantum computing technologies. In this work, we study the impact of fabrication steps and post-fabrication cleaning processes on the loss mechanisms in aluminum-based coplanar waveguide resonators. In preliminary measurements we find quality (Q) factors upto 1 million in the single-photon regime. To distinguish between different loss mechanisms, we study the Q factor in dependence on the width of the coplanar waveguides and explore the influence of changes in the cleaning procedures. This study aims to identify and mitigate sources of loss in superconducting devices fabricated with an all-aluminum process.