Strain Engineering of NdNiO3 Thin Films with Substrate-implanted Helium

Nickelates provide a platform for studying strongly correlated electron physics, where charge,spin, and structural degrees of freedom couple with each other. Small perturbations to the nickelates' perovskite structure can modify their electronic and magnetic properties. NdNiO3 in particular undergoes concomitant paramagnetic-metal to antiferromagnetic-insulator transitions at ~200K, and recently we have observed Helium ion implantation in NdNiO3 films changes strain uniaxially and suppresses these transitions.We have used various X-ray techniques to study the effects of Helium implantation in NdNiO3 films of different strain configurations. The results of this work will contribute to the development of ground-state property-tuning in oxides in general.