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Fabrication of ultra-clean gate-tunable rhombohedral multilayer graphene devices for STM study (Part 1)

POSTER

Abstract

Rhombohedral multilayer graphene exhibits exotic correlated electronic states and topological phases, such as the integer and fractional Chern insulating states. While prior studies have used transport methods to probe these properties, direct STM studies remain limited, particularly for higher-layer structures. Here, we present the fabrication of gate-tunable rhombohedral multilayer graphene devices. Our poster details the device fabrication process of using a novel PVC dry transfer technique to prevent the rhombohedral domain from relaxing while ensuring a clean surface for STM studies.

Presenters

  • Bowei Yang

    University of California, Berkeley

Authors

  • Bowei Yang

    University of California, Berkeley

  • Aining Hu

    University of California, Berkeley

  • Boxi Li

    University of California, Berkeley, Peking Univ

  • Xu Wei

    Massachusetts Institute of Technology

  • Dhanvanth Balakrishnan

    University of California, Berkeley

  • Yi-Fan Zhao

    University of California, Berkeley

  • Tonghang Han

    Massachusetts Institute of Technology

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Functional Materials, National Institute for Materials Science, Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan, National Institute of Materials Science, Advanced Materials Laboratory, National Institute for Materials Science

  • Takashi Taniguchi

    National Institute for Materials Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan, Advanced Materials Laboratory, National Institute for Materials Science

  • Alex K Zettl

    University of California, Berkeley

  • feng wang

    University of California, Berkeley

  • Long Ju

    MIT

  • Alexander Weber-Bargioni

    Lawrence Berkeley National Laboratory

  • Michael F Crommie

    University of California, Berkeley