Fabrication of ultra-clean gate-tunable rhombohedral multilayer graphene devices for STM study (Part 1)
POSTER
Abstract
Presenters
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Bowei Yang
University of California, Berkeley
Authors
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Bowei Yang
University of California, Berkeley
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Aining Hu
University of California, Berkeley
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Boxi Li
University of California, Berkeley, Peking Univ
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Xu Wei
Massachusetts Institute of Technology
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Dhanvanth Balakrishnan
University of California, Berkeley
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Yi-Fan Zhao
University of California, Berkeley
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Tonghang Han
Massachusetts Institute of Technology
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Kenji Watanabe
National Institute for Materials Science, NIMS, Research Center for Functional Materials, National Institute for Materials Science, Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan, National Institute of Materials Science, Advanced Materials Laboratory, National Institute for Materials Science
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Takashi Taniguchi
National Institute for Materials Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan, Advanced Materials Laboratory, National Institute for Materials Science
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Alex K Zettl
University of California, Berkeley
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feng wang
University of California, Berkeley
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Long Ju
MIT
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Alexander Weber-Bargioni
Lawrence Berkeley National Laboratory
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Michael F Crommie
University of California, Berkeley