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Residue-free ohmic contacts to transition metal dichalcogenides

ORAL

Abstract

Twisted transition metal dichalcogenides (TMDs) have recently demonstrated intriguing phenomena, including the fractional quantum anomalous Hall effect and superconductivity. However, achieving reliable ohmic contacts to TMDs at low temperatures is challenging due to Schottky barriers at the metal-semiconductor interface. One way of making p-type contacts is to use high-work-function metal electrodes, such as platinum; however, the process involved in fabricating these contacts typically introduces contamination to the active layer due to resist residues accumulated during the lithographic process prior to completion of the heterostructure. Here, we present a method for fabricating residue-free ohmic contacts to air sensitive TMD heterostructures by 'flipping' the partially completed heterostructure stack and then depositing metal through a PMMA based stencil mask. This approach avoids resist contamination and preserves a clean van der Waals interface. Using this technique, we fabricated twisted bilayer WSe₂ devices and performed magneto-transport measurements at cryogenic temperatures, and will show data consistent with correlated insulating states at both integer and fractional fillings of moiré superlattices.

Presenters

  • Yi Guo

    University of California, Santa Barbara

Authors

  • Yi Guo

    University of California, Santa Barbara

  • Richen Xiong

    University of California, Santa Barbara

  • Youngjoon Choi

    University of California, Santa Barbara

  • Fanzhao Yin

    University of California, Santa Barbara

  • Takashi Taniguchi

    National Institute for Materials Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan, Advanced Materials Laboratory, National Institute for Materials Science

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Functional Materials, National Institute for Materials Science, Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan, National Institute of Materials Science, Advanced Materials Laboratory, National Institute for Materials Science

  • Chenhao Jin

    University of California, Santa Barbara, Cornell University, University of California at Santa Barbara

  • Andrea F Young

    University of California, Santa Barbara, University of California Santa Barbara, University of California at Santa Barbara