Study of Growth and Properties of Chromium Oxynitride Thin Films for Supercapacitor Electrodes

This study presents an in-depth analysis of the synthesis and characterization of chromium and chromium oxynitride (CrO_xN_1-x) thin films grown on silicon and fused silica substrates by radiofrequency magnetron sputtering. The films are studied for their potential application as electrodes in supercapacitors. The effect of the growth conditions on the structural, electronic, and optical properties are studied. The bandgap of CrO_xN_1-x is found to change from 0.28 eV to 2.85 eV [1]. The Cr and CrO_xN_1-x films demonstrate interesting electrochemical performance, such as areal capacitance, cyclic stability, charge retention, and Coulombic efficiency. These results show the impact of growth conditions on the characteristics of the films and their implications for enhancing supercapacitor performance.