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STM investigation of rhombohedral multilayer graphene

ORAL

Abstract

Rhombohedral multilayer graphene has emerged as a useful platform for studying strongly correlated electronic states and topological phases, including integer and fractional Chern insulating states. Using scanning tunneling microscopy and spectroscopy (STM/S) at 4K, we have investigated the electronic properties of gate-tunable rhombohedral graphene that have different numbers of layers. Comparison of the local density of states signatures for rhombohedral graphene versus bernal graphene allows us to identify the STM/S features associated with different stacking-orders.

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Presenters

  • Aining Hu

    University of California, Berkeley

Authors

  • Aining Hu

    University of California, Berkeley

  • Bowei Yang

    University of California, Berkeley

  • Boxi Li

    University of California, Berkeley, Peking Univ

  • Dhanvanth Balakrishnan

    University of California, Berkeley

  • Xu Wei

    Massachusetts Institute of Technology

  • Yi-Fan Zhao

    University of California, Berkeley

  • Tonghang Han

    Massachusetts Institute of Technology

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Functional Materials, National Institute for Materials Science, Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan, National Institute of Materials Science, Advanced Materials Laboratory, National Institute for Materials Science

  • Takashi Taniguchi

    National Institute for Materials Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan, Advanced Materials Laboratory, National Institute for Materials Science

  • Alex K Zettl

    University of California, Berkeley

  • feng wang

    University of California, Berkeley

  • Long Ju

    MIT

  • Alexander Weber-Bargioni

    Lawrence Berkeley National Laboratory

  • Michael F Crommie

    University of California, Berkeley