APS Logo

Experimental detection of vortices in magic-angle graphene: Part 2

ORAL

Abstract

Planar Josephson junctions made from atomically thin films exhibit poor transverse screening, causing the magnetic-field dependence of the Josephson current Ic(B) to deviate from the standard Fraunhofer pattern of conventional junctions. The relevant flux determining the oscillations in Ic(B) is not the usual flux Φλ = 2BWλL penetrating the junction but the larger flux ΦW = 2BW2, including the lead areas near the junction, with W the junction width. The envelope of the Fraunhofer-like pattern also differs, with maxima decaying slowly as ∝ 1/√B rather than the usual ∝ 1/B.

Given the weak screening, the junction is highly sensitive to Pearl vortices in the leads. Vortices alter the phase pattern and affect the Josephson current. Thermal fluctuations can cause vortices to jump in and out of the leads, leading to shifts in the Fraunhofer-like pattern, as observed in our experiment [1]. Our model quantitatively explains these jumps, whose timescale depends on magnetic field, current, temperature, and superfluid stiffness. At elevated temperatures, fast vortex jumps may wash out the Fraunhofer pattern well below Tc. By analyzing the timescale of these jumps, we can determine the superfluid stiffness and the Berezinskii-Kosterlitz-Thouless transition temperature of magic-angle twisted four-layer graphene.

[1] Perego, Marta, et al. "Experimental detection of vortices in magic-angle graphene." arXiv preprint arXiv:2410.03508 (2024).

Publication: Perego, Marta, et al. "Experimental detection of vortices in magic-angle graphene." arXiv preprint arXiv:2410.03508 (2024)

Presenters

  • Vadim Geshkenbein

    3Institut fur Theoretische Physik, ETH Zurich, ETH Zurich

Authors

  • Vadim Geshkenbein

    3Institut fur Theoretische Physik, ETH Zurich, ETH Zurich

  • Marta Perego

    ETH Zurich

  • Clara Galante

    ETH Zurich

  • Alexandra Mestre-Torà

    ETH Zurich

  • Elías Portolés

    ETH Zurich

  • Artem O. Denisov

    ETH Zurich

  • Takashi Taniguchi

    National Institute for Materials Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan, Advanced Materials Laboratory, National Institute for Materials Science

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Functional Materials, National Institute for Materials Science, Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan, National Institute of Materials Science, Advanced Materials Laboratory, National Institute for Materials Science

  • Filippo Gaggioli

    MIT, ETH Zurich

  • Gianni Blatter

    ETH Zurich

  • Thomas Ihn

    ETH Zurich

  • Klaus Ensslin

    ETH Zurich