Higher order topological edge states revealed by unsupervised machine learning technique on Bi(110) thin film
ORAL
Abstract
We performed Spectroscopic Imaging Scanning Tunneling Microscopy measurements on the (110) surface of the topological Bi thin film that is synthesized by Molecular Beam Epitaxy technique. We observed enhanced local density of states at particular edges of the Bi(110) islands, exhibiting one dimensional dispersive feature, which is consistent with previously observed higher order topological edge states in this compound. In this study, we introduce the k-means clustering algorithm, which is a non-supervised machine learning technique, to classify electronic structure on the Bi(110) surface and demonstrate that this algorithm can successfully identify the higher order topological edge states. Our results suggest that the k-means clustering technique is powerful and can be used to identify novel quantum electronic states in quantum materials.
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Presenters
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Kazuhiro Fujita
Brookhaven National Laboratory (BNL)
Authors
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Kazuhiro Fujita
Brookhaven National Laboratory (BNL)
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Raymond Edward Blackwell
Stony Brook University (SUNY)
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Zengyi Du
Brookhaven National Laboratory
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Hui Li
Northwestern University, Brookhaven National Laboratory
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Zebin Wu
Brookhaven National Laboratory (BNL)
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Ilya K Drozdov
Google LLC, Brookhaven National Laboratory
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Ivan Bozovic
Brookhaven National Laboratory (BNL)
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Abhay Pasupathy
Columbia University, Brookhaven National Laboratory (BNL)