Volumetric Patterning of Thick Gel Films via Interference Lithography
ORAL
Abstract
The volumetric patterning of thick gel films using interference lithography will be discussed. A simple photokinetic model is used to gain insight into experimentally observed trends in achievable critical dimensions, resolutions and print speeds.
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Presenters
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Chaitanya Ullal
Rensselaer Polytechnic Institute
Authors
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Chaitanya Ullal
Rensselaer Polytechnic Institute
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Shaheen Hasan
Rensselaer Polytechnic Institute
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Mrigaraj Goswami
Rensselaer Polytechnic Institute
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Gopal Kenath
Rensselaer Polytechnic Institute
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Harikrishnan Vijayamohanan
Massachusetts Institute of Technology, Rensselaer Polytechnic Institute
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Xuan Luo
University of Central Florida
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Edmund Palermo
Rensselaer Polytechnic Institute
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Kyu young Han
University of Central Florida
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Jason Huang
Rensselaer Polytechnic Institute
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Apostolos Karanastasis
Rensselaer Polytechnic Institute