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Two types of colossal magnetoresistance with distinct mechanisms in Eu5In2As6

ORAL

Abstract

Recent reports of colossal negative magnetoresistance (CMR) in a few magnetic semimetals and semiconductors has attracted attention, because these materials are devoid of the conventional mechanisms of CMR such as mixed valence, double exchange interaction, and Jahn-Teller distortion [1]. New mechanisms have thus been proposed, including topological phase transition [2], ferromagnetic clusters [3], orbital currents [4], and charge ordering [5]. The CMR in these compounds have been reported in two general forms of either a resistivity peak or a resistivity upturn, which is suppressed by a magnetic field. Here we reveal both types of CMR in a single antiferromagnetic semiconductor Eu5In2As6. Using the transport and thermodynamic measurements, we show that the peak-type CMR is due to the formation of magnetic polarons, and the upturn-type CMR is due to charge segregation or charge ordering. We argue that similar mechanisms are at work in other compounds, and thus present a unifying framework to understand CMR in seemingly different materials.

Publication: [1] Wang, Z.-C, et al., Colossal Magnetoresistance without Mixed Valence in a Layered Phosphide Crystal. Adv. Mater. 2021, 33, 2005755.<br>[2] Eliot Heinrich, et al.,PHYSICAL REVIEW B 106, 214402 (2022)<br>[3] V. Sunko, Y. Sun, M. Vranas, et al.,PHYSICAL REVIEW B 107, 144404 (2023)<br>[4] Yu Zhang, et al.,Nature 611, 467–472 (2022)<br>[5] Ratnadwip Singha et al.,Sci. Adv.9, eadh0145 (2023)

Presenters

  • Sudhaman Balguri

    Boston College

Authors

  • Sudhaman Balguri

    Boston College

  • Mira Belle B Mahendru

    Boston College

  • Enrique Gonzalez Delgado

    Boston College

  • Kyle WIlliam Fruhling

    Boston College

  • Xiaohan Yao

    Boston College

  • David E Graf

    Florida State University, National High Magnetic Field Laboratory, Florida State University, Tallahassee, FL, NHMFL

  • Jose A Rodriguez

    National Institute of Standards and Technology (NIST), NIST

  • Adam A Aczel

    Oak Ridge National Laboratory

  • Andreas Rydh

    Stockholm University

  • Jonathan Gaudet

    National Institute of Standards and Technology (NIST)

  • Fazel Tafti

    Boston College