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Gate-Switchable Molecular Diffusion on a Graphene Field-Effect Transistor

ORAL

Abstract

Controlling the surface diffusion of particles on 2D devices creates opportunities for advancing microscopic processes such as nano-assembly, thin-film growth, and catalysis. Here, we demonstrate the ability to control the diffusion of F4TCNQ molecules at the surface of clean graphene field-effect transistors (FETs) via electrostatic gating. Tuning the back-gate voltage (VG) of a graphene FET switches molecular adsorbates between negative and neutral charge states, leading to dramatic changes in their diffusion properties. Scanning tunneling microscopy measurements reveal that the diffusivity of neutral molecules decreases rapidly with a decreasing VG and involves rotational diffusion processes. The molecular diffusivity of negatively charged molecules, on the other hand, remains nearly constant over a wide range of applied VG values and is dominated by purely translational processes. First-principles density functional theory calculations confirm that the energy landscapes experienced by neutral vs charged molecules lead to diffusion behavior consistent with experiment. Gate-tunability of the diffusion barrier for F4TCNQ molecules on graphene enables graphene FETs to act as diffusion switches.

Presenters

  • Yiming Yang

    University of California, Berkeley

Authors

  • Yiming Yang

    University of California, Berkeley

  • Franklin Liou

    University of California, Berkeley

  • Hsin-Zon Tsai

    UC Berkeley

  • Zachary AH Goodwin

    University of Oxford, Harvard University

  • Andrew S Aikawa

    University of California, Berkeley

  • Brian Angeles

    UC Berkeley

  • Sergio Pezzini

    NEST, Istituto Nanoscienze-CNR and Scuola Normale Superiore

  • Luc Nguyen

    University of California, Berkeley

  • Sergey Trishin

    University of California, Berkeley

  • Zhichao Cheng

    Tsinghua University

  • Shizhe Zhou

    Penn State University

  • Paul W Roberts

    UC Berkeley

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Functional Materials, National Institute for Materials Science, Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan, National Institute of Materials Science, Advanced Materials Laboratory, National Institute for Materials Science

  • Takashi Taniguchi

    National Institute for Materials Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan, Advanced Materials Laboratory, National Institute for Materials Science

  • Vittorio Bellani

    Univ Degli Studi Di Pavia

  • feng wang

    University of California, Berkeley

  • Johannes C Lischner

    Imperial College London

  • Michael F Crommie

    University of California, Berkeley