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Chern insulators at integer and fractional filling in moiré rhombohedral pentalayer graphene: Part II

ORAL

Abstract

The interplay of topology and strong correlations has been used to great advantage in recent years in moiré systems, leading to the remarkable discoveries of integer and fractional quantum anomalous Hall effects (IQAHE/FQAHE) in twisted MoTe2 and rhombohedral pentalayer graphene (RPG) aligned to boron nitride. However, the nature of these states and their relation to other theoretically predicted correlation-driven topological states remains unclear. In this presentation, we show that in a RPG sample aligned to boron nitride there is a topological state formed at fractional band filling ν = 2/3. Although this is reminiscent of the FQAH state reported in Ref. 1, the state we observe has integer, rather than fractional, quantized Hall conductance (with Chern number of C = 1). We see two additional C = 1 Chern insulators associated with ν = 1/4 and 1/3 upon applying a magnetic field. These states are most naturally explained by the formation of topological electronic crystals that spontaneously break the discrete translational symmetry of the moiré lattice. Within a narrow regime of parameter space at modest magnetic field, we further see signs of a weakly developed fractional Chern insulator that projects to ν = 2/3 filling at zero field. In the same sample, we also find a unique sequence of incipient Chern insulators arising over a broad range of incommensurate band filling near two holes per moiré unit cell. Our results establish moiré RPG as a fertile platform for studying the interplay of electronic crystallization and topological charge fractionalization.

Presenters

  • Dacen Waters

    University of Denver

Authors

  • Dacen Waters

    University of Denver

  • Anna Okounkova

    University of Washington

  • Ruiheng Su

    University of British Columbia

  • Boran Zhou

    Johns Hopkins University

  • Jiang Yao

    University of California, Irvine

  • Kenji Watanabe

    National Institute for Materials Science, NIMS, Research Center for Functional Materials, National Institute for Materials Science, Research Center for Electronic and Optical Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, Research Center for Functional Materials, National Institute of Material Science, Tsukuba, Japan, National Institute of Materials Science, Advanced Materials Laboratory, National Institute for Materials Science

  • Takashi Taniguchi

    National Institute for Materials Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Research Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-0044, Japan, International Center for Materials Nanoarchitectonics, National Institute of Material Science, Tsukuba, Japan, Advanced Materials Laboratory, National Institute for Materials Science

  • Xiaodong Xu

    University of Washington

  • Yahui Zhang

    Johns Hopkins University

  • Joshua Folk

    University of British Columbia

  • Matthew A Yankowitz

    University of Washington