Studies of properties enhancement of multifunctional self-assembled thin films deposited on biomimetic structures fabricated through nanoimprint lithography

Nanoimprint Lithography (NIL) technique is a low-cost alternative fabrication method to photolithography. It consists of transferring a pattern from a template mold onto a substrate, such as a polymer resist, which can then be cured thermally or by exposure to UV radiation. The technique allows for high-resolution, large area nanopatterning. It has been applied in creating structures for nanotechnology, electronics, optical devices, such as microlens arrays, microsystems, and for life sciences. This work in progress investigates prospects of enhanced functionality of biomimetic structures fabricated through roll-to-plate NIL technique that are coated with additional layers of self-assembled films that contain nanoparticles, such as cerium dioxide.