Design, Fabrication and Characterization of Dielectric Metasurfaces for Device Applications

Metasurfaces have emerged as a versatile platform for manipulating the wavefront of light at subwavelength resolution, enabling a wide range of applications such as beam steering, focusing, and holography. In this talk, I will present our approach to the design, fabrication, and characterization of dielectric metasurfaces composed of high-index silicon nanostructures. I will first discuss how we design metasurfaces for wavefront-shaping functionalities using rigorous coupled-wave analysis (RCWA) and finite-difference time-domain (FDTD) simulations. I will then present our efforts in device fabrication through standard semiconductor techniques, such as electron beam lithography (EBL) and reactive ion etching (RIE). Lastly, I will demonstrate our progress on device characterization using a customized free-space microscopy setup. Our results demonstrate the efficacy of these dielectric metasurfaces for integration into compact optical systems, showcasing their potential for applications in imaging, sensing, and communication technologies.