Exploring antiferromagnetic spintronics within intermetallic NiSi system
ORAL
Abstract
Antiferromagnetic materials hold potential for spintronic applications due to their robustness, lack of stray fields, fast dynamics, and significant magnetotransport properties. Ongoing research on unconventional antiferromagnets like Mn3Si, FeGe, Mn2Au, etc., has made them promising candidates for spin-based applications. Our recent efforts to grow a single crystal of the stoichiometric Nickel silicon system have successfully showcased magnetic order for the first time. Extensive neutron diffraction measurements have revealed non-trivial temperature dependences of nuclear as well as odd reciprocal lattice positions, indicating the existence of an uncompensated antiferromagnetic order with an onset temperature TN = 700 K in the system. This system is further observed to exhibit hysteresis behavior with one-step switching characteristics at a very small critical field of H ~ 900 Oe applied perpendicular to the direction of non-compensated (ferromagnetic) moments accounting for the switching between two distinct ferromagnetic spin configurations. Hall probe measurements unveil intricate magneto-electronic hysteresis in both longitudinal and Hall resistance at high temperatures, demonstrating unique antiferromagnetic spin correlation distinct from magnetometry results. These characteristics emphasize the significance of NiSi in propelling antiferromagnetic spintronics research.
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Publication: P. Ghosh, J. Guo, F. Ye, T. Heitmann, S. Kelley, A. Ernst, V. Dugaev, D. K. Singh. NiSi: A New Venue for Antiferromagnetic Spintronics. Adv. Mater. June 2023 <br>https://doi.org/10.1002/adma.202302120
Presenters
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Pousali Ghosh
The University of Missouri-Columbia
Authors
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Pousali Ghosh
The University of Missouri-Columbia
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Deepak K Singh
University of Missouri
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Jiasen Guo
Oak Ridge National Lab
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Feng Ye
Oak Ridge National Laboratory
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Tom W Heitmann
University of Missouri
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Arthur Ernst
Max Planck Institute of Microstructure Physics, Halle, Germany
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Vitalli Dugaev
Rzeszów University of Technology (Poland)
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Steven Kelley
University of Missouri