True Atomic-Resolution Surface Imaging under Ambient Conditions via High-Speed Conductive Atomic Force Microscopy

A wide range of physical phenomena are governed by the atomic-scale structure and properties of material surfaces. Yet, the principal tools utilized to characterize surfaces at the atomic level rely on strict environmental conditions such as ultrahigh vacuum and low temperature. Results obtained under such well-controlled, pristine conditions bear little relevance for the great majority of processes and applications that often occur under ambient conditions. Here, we report true atomic-resolution surface imaging via conductive atomic force microscopy (C-AFM) under ambient conditions, performed at high scanning speeds [1]. Our approach delivers atomic-resolution maps on a variety of surfaces, most prominently from the 2D materials family. With our method, we are able to resolve single atomic vacancies, in addition to other types of defects. Our findings demonstrate that C-AFM can be utilized as a powerful tool for atomic-resolution imaging of surface structure under ambient conditions, with wide-ranging applicability.



[1] S.A. Sumaiya, J. Liu, M.Z. Baykara, ACS Nano, in press (2022).