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Programmable quantum Hall array resistance standards in epitaxial graphene devices

ORAL

Abstract

The quantum Hall effect (QHE) provides an invariant reference for resistance related to the elementary charge e and Planck constant h, and the International System of Units (SI) unit of resistance has been redefined, thereby fixing the von Klitzing constant , to a constant value[1-3]. Graphene, due to its inherently two-dimensional structure and superior electrical properties, has a robust quantum Hall plateau at , where is the filling factor, and has become an ideal material for developing quantum Hall resistance standards.

Based on a single Hall bar device with quantized resistance value (RK/2~12.9 kΩ), many possible resistance values (m*RK/2) can be obtained by connecting quantum Hall devices in parallel or in series connection [4]. So far, the nearly 1 kΩ and 1.29 MΩ quantum Hall resistance array standards have been tested [5,6] using Multi-terminal superconducting contacts are used for interceonnection and magnetotransport measurements [7].

In this work, epitaxial graphene is grown on a SiC substrate [8], and is functionalized with Cr(CO)3 [9]. The quality of graphene is assessed by confocal laser scanning microscopy. To obtain various quantized resistances, we fabricated graphene Hall bar network devices using graphene as interconnections. We use top gate to manipulate graphene interconnections, and program the graphene array. Precision measurements are obtained with a DC current comparator and cryogenic current comparator.

Publication: 1. K. von Klitzing, G. Dorda, and M. Pepper, New method for high-accuracy determination of the fine-structure constant based on quantized Hall resistance, Phys. Rev. Lett. 45, 494 (1980).<br>2. K. von Klitzing and G. Ebert, Application of the quantum Hall effect in metrology, Metrologia, 21, 11 (1985).<br>3. K. von Klitzing, T. Chakraborty, P. Kim, V. Madhavan, X. Dai, J. McIver, Y. Tokura, L. Savary, D. Smirnova, A. M. Rey et al., 40 years of the quantum Hall effect, Nat. Rev. Phys. 2, 397 (2020).<br>4. F. Delahaye, Series and parallel connection of multiterminal quantum Hall-effect devices, J. Appl. Phys. 73, 7914 (1993).<br>5. A. R. Panna, I.-F. Hu, M. Kruskopf, D. K. Patel, D. G. Jarrett, C.-I. Liu, S. U. Payagala, D. Saha, A. F. Rigosi, D. B. Newell, C.-T. Liang, and R. E. Elmquist, "Graphene quantum Hall effect parallel resistance arrays", Phys. Rev. B 103, 075408 (2021).<br>6. S. M. Mhatre, N. T. M. Tran, H. M. Hill, C.-C. Yeh, D. Saha, D. B. Newell, A. R. Hight Walker, C.-T. Liang, R. E. Elmquist and A. F. Rigosi1, Versatility of uniformly doped graphene quantum Hall arrays in series, AIP Adv. 12, 085113 (2022).<br>7. A. F. Rigosi, M. Kruskopf, H. M. Hill, H. J., B.-Y. Wu, P. E. Johnson, S. Zhang, M. Berilla, A. R. Hight-Walker, C. A. Hacker, D. B. Newell and R. E. Elmquist, Gateless and reversible carrier density tunability in epitaxial graphene devices functionalized with chromium tricarbonyl, Carbon 142, 468 (2019).<br>8. M. Kruskopf, D. M. Pakdehi, K. Pierz, S. Wundrack, R. Stosch, T. Dziomba, M. Götz, J. Baringhaus, J. Aprojanz and C. Tegenkamp, Comeback of epitaxial graphene for electronics: large-area growth of bilayer-free graphene on SiC, 2D Mater. 3 041002 (2016).<br>9. M. Kruskopf, A. F. Rigosi, A. R. Panna, D. K. Patel, H. Jin, M. Marzano, M.l Berilla, D. B. Newell and R. E. Elmquist, Two-Terminal and Multi-Terminal Designs for Next-Generation Quantized Hall Resistance Standards: Contact Material and Geometry, IEEE T ELECTRON DEV 66, 9 (2019).

Presenters

  • Ching-Chen Yeh

    National Institute of Standards and Technology

Authors

  • Ching-Chen Yeh

    National Institute of Standards and Technology

  • Swapnil M Mhatre

    National Institute of Standards and Technology

  • Yanfei Yang

    Graphene Waves

  • Alireza R Panna

    National Institute of Standards and Technology

  • Ngoc Thanh Mai Tran

    Joint Quantum Institute, Joint Quantum Institute, University of Maryland

  • Shamith Payagala

    National Institute of Standards and Technology

  • David B Newell

    National Institute of Standards and Technology

  • Dean G Jarrett

    National Institute of Standards and Technology

  • Albert F Rigosi

    National Institute of Standards and Technology, NIST

  • Randolph E Elmquist

    National Institute of Standards and Technology

  • Chi-Te Liang

    Natl Taiwan Univ, National Taiwan University