Enabling direct write fabrication of low dimensional micro- and nanostructures on supported and suspended substrates using custom inks and CVD synthesis

Low dimensional nanomaterials such as 1D or 2D systems, assembled in vertical or lateral arrangements, often lead to the enhanced properties, and new functionalities. Nanotubes, nanowires (NWs), and 2D layered structures are emerging as key building blocks for the next generation technologies. Practical implementation of such nanomaterials necessitates their successful incorporation with well-established processes for fabrication of electrical and mechanical devices. While the preparation of layered architectures usually involves multi-step fabrication processes it also relies on mask assisted fabrication techniques. Here we present methodology for controlled and selective preparation of nanostructures such as 1D ZnO NWs or 2D TMDC, in various controlled geometric assemblies, by employing direct write patterning (DWP) of custom ink precursors on supported or suspended architectures. Our two-step fabrication approach enables simple and flexible production of various architectures in a precisely controlled fashion. Location specific synthesis of materials provides access to as-grown interfaces and rapid testing of materials’ quality, crystallinity and chemical composition, etc.