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Doping dependence of the critical current properties in Bi<sub>2.2</sub>Sr<sub>1.8</sub>CaCu<sub>2</sub>O<sub>8+</sub><sub>δ</sub> single crystals

POSTER

Abstract

In high-Tc cuprate superconductors, the doping (p) dependence of the critical temperature (Tc) and the upper critical field (Hc2) has been intensively investigated to optimize the properties and to elucidate the electronic phase diagram. On the other hand, for the critical current density (Jc), although it is empirically known that Jc increases in the overdoped region, the detailed p dependence has not been established because Jc strongly depends on inhomogeneities such as defects and impurities. Therefore, establishing the detailed p dependence of Jc is expected to provide new insights into optimizing Jc and understanding the electronic phase diagram.

In this study, we focused on Bi2Sr2CaCu2O8+δ (Bi2212), where p can be tuned over a wide range by controlling the excess oxygen content δ. By repeating the p control and Jc evaluation on the same Bi2212 single crystal sample, the influence of crystal characteristics (chemical composition, defect structure, etc.) on Jc was reduced. Thus, a systematic p dependence of Jc was successfully obtained. Notably, we found that Jc unexpectedly increases in the underdoped region at low temperatures. In the meeting, we will report the results in detail and discuss the possible origin of the enhancement of Jc.

Presenters

  • Junichiro Kato

    Tokyo University of Science

Authors

  • Junichiro Kato

    Tokyo University of Science

  • YUTARO MINO

    Tokyo University of Science

  • PVAN KUMAR NAIK SUGALI

    Tokyo University of Science

  • Taichiro Nishio

    Tokyo University of Science

  • Syungo Nakagawa

    University of Tsukuba, University of Tsukuba, Japan

  • Takanari Kashiwagi

    University of Tsukuba, University of Tsukuba, Japan

  • Hiroshi Eisaki

    Inst. of Advanced Industrial Science and Tech., Tsukuba, Ibaraki 305-8568, Japan., National Institute of Advanced Industrial Science and Technology, Electronics and Photonics Research Institute, National Institute of Advanced Industrial Science and Technology, Tsukuba, Ibaraki, Japan, AIST, Inst. of Advanced Industrial Science and Tech., AIST, Tsukuba, Japan

  • Shigeyuki Ishida

    National Institute of Advanced Industrial Science and Technology, AIST, AIST, Tsukuba, Japan