"Effects of X-ray Exposure on the Physical Characteristics of Metallic Thin Films"

This experiment is designed to understand the impacts of broad spectrum radiation on metallic films with emphasis on corrosion resistance. There was an analysis of depositions of films on a silicon substrate: Copper, Titanium, Titanium Nitride, Silver, and Aluminum. These depositions were analyzed through Scanning Electron Microscopes and Energy Dispersive X-ray Spectroscopy then irradiated through a rhodium source. These atomic compositions of these samples were compared before and after x-ray exposure and determined to have an increase in oxygen composition. These x-rayed films underwent a series of acid etching tests and the x-rayed samples had an increased resistivity to corrosion. The resistivity was visual in decreased pitting in the films. The composition of the oxide layer was analyzed through the SEM. This experiment showed an increase in oxygen content for all materials irradiated with a rhodium source. Evidence suggests x-rays induced an ionization reaction at the surface which creates an oxide layer for all materials investigated. In most instances, the oxide layer forms a corrosion resistant surface layer. Limited evidence suggests an improvement in adhesion resulting from oxygen availability at the coating and substrate interface.