Revealing interface roughness and chemical composition distribution in III-V semiconductor quantum wells at the atomic scale
POSTER
Abstract
Publication: [1] C. Thomas, A. T. Hatke, A. Tuaz, R. Kallaher, T. Wu, T. Wang, R. E. Diaz, G. C. Gardner, M. A. Capano, and M. J. Manfra, Phys. Rev. Mat. 2, 104602 (2018)<br>[2] M. Nord, P. Vullum, I. MacLaren, T. Tybell, and R. Holmestad, Adv. Struct. Chem. Imaging 3, 9 (2017)<br>[3] K. Muraki, S. Fukatsu, Y. Shiraki, and R. Ito, J. Crystal Growth 127, 546 (1993)
Presenters
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Roy D Peña
Department of Electrical, Electronics, Informatic, and Mechanical Engineering, Universidad Nacional de San Antonio Abad del Cusco, Cusco, Peru
Authors
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Roy D Peña
Department of Electrical, Electronics, Informatic, and Mechanical Engineering, Universidad Nacional de San Antonio Abad del Cusco, Cusco, Peru
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Rosa E Diaz
Birck Nanotechnology Center, Purdue University, West Lafayette, IN, USA
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Shuang Liang
Purdue University
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Michael J Manfra
Purdue University, Microsoft Quantum Purdue, Purdue University, Birck Nanotechnology Center, Purdue University, West Lafayette, IN, USA; Microsoft Quantum Lab, Purdue University, West Lafayette, IN, USA, Physics and Astronomy, Purdue University, Department of Physics and Astronomy, Birck Nanotechnology Center, School of Electrical and Computer Engineering and Microsoft Quantum Lab West Lafayette, Purdue University, Department of Physics and Astronomy and Nanotechnology Center Purdue University, Microsoft Quantum Lab West Lafayette, Department of Physics and Astronomy, Birck Nanotechnology Center, School of Materials Engineering and School of Electrical and Computer Engineering, Purdue University