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Mitigation of Interface Losses in Transmon Qubits Using Hydrofluoric Etches

ORAL

Abstract

Superconducting transmon qubits, a promising hardware platform for quantum computing applications, have developed from proof-of principle single-bit demonstrations to mature deployments of many-qubit quantum processors. Reducing losses in superconducting qubit circuits is critical to further the development of large-scale transmon architectures. In this talk we discuss the potential of hydrofluoric etches to remove lossy silicon oxides in close proximity to sensitive circuit elements such as Josephson Junctions, resonators and crossover tethers. This etch can be implemented at several different process points during the fabrication of these elements with little to no damage to existing structures. The results and future potential of these etches will be discussed.

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Presenters

  • Michael A Gingras

    MIT Lincoln Lab, MIT Lincoln Laboratory

Authors

  • Michael A Gingras

    MIT Lincoln Lab, MIT Lincoln Laboratory

  • Kyle Serniak

    MIT Lincoln Laboratory

  • Greg Calusine

    MIT Lincoln Lab

  • David K Kim

    MIT Lincoln Lab, MIT Lincoln Laboratory

  • Alexander Melville

    MIT Lincoln Laboratory

  • Ali Sabbah

    MIT Lincoln Laboratory

  • Kate Azar

    MIT Lincoln Laboratory

  • Wayne Woods

    MIT Lincoln Lab

  • Jeffrey Knecht

    MIT Lincoln Lab, MIT Lincoln Laboratory

  • Bethany M Niedzielski

    MIT Lincoln Lab, MIT Lincoln Laboratory

  • Cyrus F Hirjibehedin

    MIT Lincoln Lab

  • Mollie E Schwartz

    MIT Lincoln Laboratory

  • Jonilyn L Yoder

    MIT Lincoln Lab, MIT Lincoln Laboratory

  • William D Oliver

    Massachusetts Institute of Technology MIT, Massachusetts Institute of Technology (MIT), MIT Lincoln Laboratory, Massachusetts Institute of Technology (MIT), Massachusetts Institute of Technology, Massachusetts Institute of Technology, MIT Lincoln Laboratory