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Ferroelectric field effect in few-layer CrCl<sub>3</sub> tunnel junctions top-gated by PbZr<sub>0.2</sub>Ti<sub>0.8</sub>O<sub>3</sub> membranes

ORAL

Abstract

We report the ferroelectric gating control of few-layer antiferromagnetic CrCl3 tunnel junctions. High-quality CrCl3 flakes are synthesized on mica by the physical vapor transport technique [1]. Epitaxial ferroelectric PbZr0.2Ti0.8O3 (PZT) films (50 nm) are deposited on Sr3Al2O6 (SAO) buffered (001) SrTiO3 substrates and suspended via dissolving the SAO layer in water. Selected few-layer CrCl3 flakes are fabricated into graphite/CrCl3/graphite tunnel junctions by the all-dry stamping transfer method, which are encapsulated by either PZT membranes or h-BN flakes. Using conductive atomic force microscopy, we pole the PZT top-layer to uniformly polarized up and down states. Polarization reversal leads to nonvolatile modulation of the tunneling current, with an on/off ratio of 106 obtained at room temperature. Compared with h-BN encapsulated devices, the PZT-gated CrCl3 tunnel junctions exhibit distinct magnetotransport properties. The tunneling magnetoresistance changes sign at low temperature, suggesting a change of magnetic state. Our study provides an effectively strategy to design CrCl3-based nonvolatile memory and spintronic applications.

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Publication: Jia Wang, et al., arXiv:2208.06298 (2022).

Presenters

  • Jia Wang

    Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, University of Nebraska-Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and NanoscienceUniversity of Nebraska-Lincoln, Physics and Astronomy, University of Nebraska-Lincoln

Authors

  • Jia Wang

    Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, University of Nebraska-Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and NanoscienceUniversity of Nebraska-Lincoln, Physics and Astronomy, University of Nebraska-Lincoln

  • Qiuchen Wu

    University of Nebraska - Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and NanoscienceUniversity of Nebraska - Lincoln, Physics and Astronomy, University of Nebraska-Lincoln

  • Kun Wang

    University of Nebraska - Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and NanoscienceUniversity of Nebraska - Lincoln, Physics and Astronomy, University of Nebraska-Lincoln

  • Takashi Taniguchi

    National Institute for Materials Science, Kyoto Univ, International Center for Materials Nanoarchitectonics, National Institute of Materials Science, Kyoto University, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-044, Japan, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, National Institute for Materials Science, Japan, National Institute For Materials Science, NIMS, National Institute for Material Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Japan, NIMS Japan

  • Kenji Watanabe

    National Institute for Materials Science, Research Center for Functional Materials, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-044, Japan, NIMS, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science, Japan, Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Japan, NIMS Japan

  • Xia Hong

    Physics and Astronomy, University of Nebraska-Lincoln, Department of Physics and Astronomy & Nebraska Center for Materials and Nanoscience, University of Nebraska-Lincoln