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Electronic topology-driven helicoid arc van Hove singularities in tunable chiral fermion conductors

ORAL

Abstract

The classification scheme of electronic phases uses two prominent paradigms: correlations and topology. Electron correlations give rise to superconductivity and charge density waves, while the quantum geometric Berry phase gives rise to electronic topology. The intersection of these two paradigms has initiated an effort to discover electronic instabilities at or near the Fermi level of topological materials. Here, we identify the electronic topology of chiral fermions as the driving mechanism for creating van Hove singularities that host electronic instabilities in the surface band structure. We observe that the chiral fermion conductors RhSi and CoSi possess two types of helicoid arc van Hove singularities that we call type-I and type-II. In RhSi, the type-I variety drives a switching of the connectivity of the helicoid arcs at different energies. In CoSi, we measure a type-II intra-helicoid arc van Hove singularity near the Fermi level. Chemical engineering methods are able to tune the energy of these singularities. Finally, electronic susceptibility calculations allow us to visualize the dominant Fermi surface nesting vectors of the helicoid arc singularities, consistent with recent observations of surface charge density wave ordering in CoSi. This suggests a connection between helicoid arc singularities and surface charge density waves.

Publication: D. S. Sanchez, T. A. Cochran, ...., M. Z. Hasan. Electronic topology-driven helicoid arc van Hove singularities in tunable chiral fermion conductors. (Accepted)<br><br>T. A. Cochran, ..., M. Z. Hasan. Visualizing higher-fold topology in chiral crystals. (Submitted)<br><br>G. Chang, ..., M. Z. Hasan. Topological quantum properties of chiral crystals. Nat. Mater. 17, 978 (2018).

Presenters

  • Tyler A Cochran

    Princeton University

Authors

  • Tyler A Cochran

    Princeton University

  • Daniel S Sanchez

    Princeton University

  • Ilya Belopolski

    RIKEN, RIKEN CEMS

  • Zi-Jia Cheng

    Princeton University

  • Xian Yang

    Princeton University

  • Xitong Xu

    Peking Univ

  • Kaustuv Manna

    Max Planck Institute for Chemical Physics of Solids

  • Chandra Shekhar

    Max Planck Institute for Chemical Physics of Solids

  • Jiaxin Yin

    Princeton University

  • Horst Borrmann

    Max Planck Intitute for the Chemical Physics of Solids, Max Planck Institute for Chemical Physics of Solids

  • Jonathan D Denlinger

    Lawrence Berkeley National Laboratory, Lawrence Berkeley National Laboratory, Berkeley, California

  • Vladimir N Strocov

    Swiss Light Source, Paul Scherrer Institut, Swiss Light Source, Paul Scherrer Insitute, Swiss Light Source, Paul Scherrer Institut

  • Weiwei Xie

    Michigan State University, Department of Chemistry, Michigan State University

  • Claudia Felser

    Max Planck Institute for Chemical Physic, Max Planck Institute for Chemical Physics of Solids

  • Shuang Jia

    Peking Univ

  • Guoqing Chang

    Nanyang Technological University, Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 637371 Singapore

  • M. Zahid M Hasan

    Princeton University