APS Logo

STM studies of a Weyl semiconductor

ORAL

Abstract

Topological phases of matter are at the frontier of scientific research and have a potential to become a building block of future electronic devices. Using scanning tunneling microscopy (STM) we probe a Weyl semiconductor material and reveal defect-free atomically flat surfaces with an energy gap of We observe that the atomic surfaces separated by a monolayer step edge exhibit a switch of the intensity of the tunneling spectrum below and above the Fermi level and develop a gap difference of at 4.2 K, thus effectively realizing AB stacking sequence of atomic layers. Temperature dependent STM measurements on AB surfaces show spectroscopic contrast weakening and gap difference shrinkage with the increasing temperature. The results of our STM study indicate a surprising electronic AB stacking of layers, possibly linked to the presence of a phonon-induced instability in the material.

Presenters

  • Maksim Litskevich

    Princeton University

Authors

  • Maksim Litskevich

    Princeton University

  • Shafayat Hossain

    Princeton University

  • Yang Fu

    Renmin University of China

  • Qi Zhang

    Princeton University

  • Zi-Jia Cheng

    Princeton University

  • Guoqing Chang

    Nanyang Technological University, Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, Singapore, Division of Physics and Applied Physics, School of Physical and Mathematical Sciences, Nanyang Technological University, 637371 Singapore

  • Yu-Xiao Jiang

    Princeton University

  • Tyler A Cochran

    Princeton University

  • Daniel Multer

    Princeton University

  • Xian Yang

    Princeton University

  • Hechang Lei

    Renmin University of China, Renmin University of China, Beijing, China, Princeton University

  • M. Zahid M Hasan

    Princeton University