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Determination of the complex optical constants of thin-film vanadium dioxide on polar dielectrics

ORAL

Abstract

Vanadium dioxide (VO2) has been widely used in photonics applications because the insulator-to-metal phase transition (IMT) near 67 C provides an active and reversible character to photonics devices. The device design requires precise information on the complex optical constants of VO2 across the IMT. VO2 deposited on polar dielectrics is considered a promising photonic platform hosting surface phonon polaritons at mid-/far-infrared. However, obtaining the VO2 optical constant is limited by the accessibility of an ellipsometer at infrared wavelengths. Here, we propose a useful method to extract the complex optical constants of VO2 on polar dielectrics across the IMT which relies solely on the normal incident reflection spectrum. We prepared 100 nm thick VO2 films deposited on silicon carbide and on sapphire substrates and measured the reflectance spectra at the Reststrahlen band under normal incidence at temperatures varying from 30 C to 80 C. A model combining Kramers-Kronig (KK) relations and thin film equation was used to precisely determine the changes in the spectrum during the IMT. The determined temperature-dependent complex optical constants of the VO2 films change steeply across the IMT and slight wavelength dependence of the optical constant was observed.

Presenters

  • Myoung-Hwan Kim

    Texas Tech University, Department of Physics and Astronomy, Texas Tech University

Authors

  • Myoung-Hwan Kim

    Texas Tech University, Department of Physics and Astronomy, Texas Tech University

  • Imtiaz Ahmad

    Department of Physics and Astronomy, Texas Tech University

  • SATYANARAYANA R KACHIRAJU

    University of Texas Rio Grande Valley

  • Sundar Kunwar

    lanl, Los Alamos National Lab, Los Alamos National Laboratory, Center for Integrated Nanotechnologies (CINT), Los Alamos National Laboratory, Los Alamos, NM 87545, USA

  • Pinku Roy

    lanl, Los Alamos National Lab, Los Alamos National Laboratory, Center for Integrated Nanotechnologies (CINT), Los Alamos National Laboratory, Los Alamos, NM 87545, USA

  • Matthew Gaddy

    Texas Tech University, Department of Electrical and Computer Engineering and NanoTech Center, Texas Tech University, Lubbock, TX 79409, USA

  • Vladimir Kuryatkov

    TTU, Texas Tech University, Department of Electrical and Computer Engineering and NanoTech Center, Texas Tech University, Lubbock, TX 79409, USA

  • Zach M Brown

    Texas Tech University,, Texas Tech University

  • Yejin Kwon

    Texas Tech University

  • Ayrton A Bernussi

    Texas tech university, Texas Tech University, Department of Electrical and Computer Engineering and NanoTech Center, Texas Tech University, Lubbock, TX 79409, USA

  • Aiping Chen

    Los Alamos National Laboratory, lanl, Los Alamos National Lab, Center for Integrated Nanotechnologies (CINT), Los Alamos National Laboratory, Los Alamos, NM 87545, USA