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Improved p-type Contact to WSe<sub>2</sub> Using a α-RuCl<sub>3 </sub>Charge-Transfer Interface

ORAL

Abstract

A lack of reliable, ohmic contacts at low temperatures has been a barrier to studying the transport properties of semiconducting transition metal dichalcogenide heterostructures, particularly in the monolayer limit. Here we demonstrate a charge-transfer doping scheme, using α-RuCl3 as a strong electron acceptor, for realizing transparent contact to monolayer WSe2. Hole densities in the contact region as large as 3.2×1013 cm-2 can be achieved, resulting in contact resistances as low as 1.7 kΩ μm. Device architectures that combine high transparency contacts with independent tunning of the channel density will be discussed.

Presenters

  • Jordan Pack

    Columbia University

Authors

  • Jordan Pack

    Columbia University

  • Yinjie Guo

    Columbia University, Columbia Unviersity

  • Ziyu Liu

    Columbia University

  • Bjarke S Jessen

    Columbia University

  • Song Liu

    Columbia University

  • Luke N Holtzman

    Columbia University

  • Jiaqiang Yan

    Oak Ridge National Laboratory, Materials Science and Technology Division, Oak Ridge National Laboratory, Oak Ridge, TN 37831, USA

  • Kenji Watanabe

    National Institute for Materials Science, Research Center for Functional Materials, National Institute of Materials Science, Research Center for Functional Materials, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-044, Japan, NIMS, Research Center for Functional Materials, National Institute for Materials Science, National Institute for Materials Science, Japan, Research Center for Functional Materials, National Institute for Materials Science, Tsukuba, Japan, NIMS Japan

  • Takashi Taniguchi

    National Institute for Materials Science, Kyoto Univ, International Center for Materials Nanoarchitectonics, National Institute of Materials Science, Kyoto University, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, 1-1 Namiki, Tsukuba 305-044, Japan, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, National Institute for Materials Science, Japan, National Institute For Materials Science, NIMS, National Institute for Material Science, International Center for Materials Nanoarchitectonics, National Institute for Materials Science, Tsukuba, Japan, NIMS Japan

  • David G Mandrus

    University of Tennessee, Oak Ridge National Laboratory

  • James C Hone

    Columbia University

  • Cory R Dean

    Columbia Univ, Columbia University