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Effects of Pressure on Electronic and Magnetic Properties of Bulk NiI<sub>2</sub>

ORAL

Abstract

Transition metal dihalides have recently garnered interest in the context of two-dimensional van der Waals magnets as their underlying geometrically frustrated triangular lattice leads to interesting competing exchange interactions. In particular, NiI2 is a centrosymmetric magnetic semiconductor that has been long known for its exotic helimagnetism in the bulk. Recent breakthrough experiments have shown that the helimagnetic state survives down to the monolayer limit with a layer-dependent magnetic transition temperature that suggests a relevant role of the interlayer coupling. Here, we explore the evolution of the electronic structure and magnetic exchange interactions in NiI2 as a function of external pressure using first-principles calculations and Monte Carlo simulations. We find that the leading interlayer coupling is an antiferromagnetic second-nearest neighbor interaction that increases monotonically with pressure. The ratio between isotropic third- and first-nearest neighbor intralayer exchanges, which determines the magnetic propagation vector q of the helimagnetic ground state, monotonically increases in magnitude with pressure. As a consequence, our Monte Carlo simulations show a monotonic increase in the magnetic transition temperature indicating that pressure is an effective means to tune the magnetic ground state of NiI2.

Presenters

  • Jesse Kapeghian

    Arizona State University

Authors

  • Jesse Kapeghian

    Arizona State University

  • Antia S Botana

    Argonne National Laboratory, Arizona State University

  • Danila Amoroso

    CNR-SPIN, University of Liege

  • Matthieu J Verstraete

    University of Liege

  • Connor A Occhialini

    Massachusetts Institute of Technology

  • Luiz Gustavo Pimenta Martins

    Massachusetts Institute of Technology, MIT, Massachusetts Institute of Technology

  • Qian Song

    Massachusetts Institute of Technology, Massachusetts Institute of Technology MIT

  • Jesse S Smith

    Argonne National Lab, Argonne National Laboratory

  • Joshua J J Sanchez

    University of Washington, Massachusetts Institute of Technology

  • Jing Kong

    Massachusetts Institute of Technology

  • Riccardo Comin

    Massachusetts Institute of Technology MIT, Massachusetts Institute of Technology