Reliable Fabrication of Multi-Spin Qubit Devices in <sup>28</sup>Si/SiGe Heterostructures
ORAL
Abstract
Our fabrication flow for the spin qubit devices is split into two parts: the first part is heterostructure growth and optical patterning of ohmics on 4-inch wafers, and the second part involves completion of the device nanofabrication including fine gates on 20x20 mm coupons. We employ a systematic approach of design, fabrication and characterization to provide feedback on the material and device quality at different stages of the fabrication process. For this, we implement on-chip multilayered test structure devices of various types in order to routinely extract different device and material parameters with a standard protocol. Such a split-step approach allows us to develop a high yield process, as well as rapidly experiment with gate designs, materials and individual process steps.
The highlights of devices made with this process include a two-qubit quantum processor yielding T2* of up to 20 µs and 99.6% two-qubit gate fidelity [1], the first online two spin qubit processor [2], and a universally controlled six spin qubit quantum processor [3].
[1] Xue et al., Nature 601, 343 (2022).
[2] https://www.quantum-inspire.com/
[3] Philips et al., Nature 609, 919 (2022).
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Publication: 1.Philips, S. G. J. et al. Universal control of a six-qubit quantum processor in silicon. Nature 609, 919–924 (2022).<br>2.Wuetz, B. P. et al. Reducing charge noise in quantum dots by using thin silicon quantum wells. at http://arxiv.org/abs/2209.07242 (2022).
Presenters
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Larysa Tryputen
TNO, Qutech, Netherlands Organisation for Applied Scientific Research (TNO), QuTech and Netherlands Organization for Applied Scientific Research (TNO), Delft, The Netherlands, TNO, TNO/QuTech, TNO Netherlands Organization for Applied Scientific Research
Authors
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Sergey V Amitonov
TNO, Qutech, QuTech and TNO, Stieltjesweg 1, 2628 CK Delft, The Netherlands, QuTech and Netherlands Organization for Applied Scientific Research (TNO), Delft, The Netherlands, TNO, QuTech, TNO, TNO/QuTech
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Larysa Tryputen
TNO, Qutech, Netherlands Organisation for Applied Scientific Research (TNO), QuTech and Netherlands Organization for Applied Scientific Research (TNO), Delft, The Netherlands, TNO, TNO/QuTech, TNO Netherlands Organization for Applied Scientific Research
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Amir Sammak
TNO, Qutech, QuTech and TNO, Stieltjesweg 1, 2628 CK Delft, The Netherlands, Netherlands Organisation for Applied Scientific Research (TNO), QuTech and Netherlands Organization for Applied Scientific Research (TNO), Delft, The Netherlands, TNO, QuTech, TNO, Netherlands Organization for Applied Scientific Research (TNO), QuTech and Netherlands Organisation for Applied Scientific Research (TNO), Stieltjesweg 1, 2628 CK Delft, The Netherlands, TNO/QuTech
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Saurabh Karwal
TNO, Qutech, Netherlands Organisation for Applied Scientific Research (TNO), TNO/QuTech
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Önder Gül
TNO, Qutech, TNO, QuTech
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Yoram Vos
TNO, Qutech, TNO, QuTech
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Tumi Makinwa
TNO/Qutech, TNO, Qutech
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Rick N Wasserman
TNO, QuTech
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Delphine B Brousse
TNO, QuTech
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David J Michalak
TNO/QuTech, TNO, QuTech
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Nodar Samkharadze
TNO, Qutech, TNO, QuTech
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Giordano Scappucci
QuTech and Kavli Institute of Nanoscience, TU Delft, P.O. Box 5046, 2600 GA Delft, The Netherlands, Delft University of Technology, QuTech and the Kavli Institute of Nanoscience, Delft University of Technology, TU Delft QuTech, QuTech and Kavli Institute of Nanoscience, Delft University of Technology, P.O. Box 5046, 2600 GA Delft, The Netherlands
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Lieven M Vandersypen
Delft University of Technology, QuTech and the Kavli Institute of Nanoscience, Delft University of Technology
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Rabah Hanfoug
TNO, QuTech