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Reliable Fabrication of Multi-Spin Qubit Devices in <sup>28</sup>Si/SiGe Heterostructures

ORAL

Abstract

Well-controlled and reliably operated multi-quantum-dot devices are key component of future spin-based quantum computers. We report state-of-the-art fabrication methods of multi-quantum dot linear arrays that are defined in isotopically purified in-house grown 28Si/SiGe heterostructures for spin qubit applications.

Our fabrication flow for the spin qubit devices is split into two parts: the first part is heterostructure growth and optical patterning of ohmics on 4-inch wafers, and the second part involves completion of the device nanofabrication including fine gates on 20x20 mm coupons. We employ a systematic approach of design, fabrication and characterization to provide feedback on the material and device quality at different stages of the fabrication process. For this, we implement on-chip multilayered test structure devices of various types in order to routinely extract different device and material parameters with a standard protocol. Such a split-step approach allows us to develop a high yield process, as well as rapidly experiment with gate designs, materials and individual process steps.

The highlights of devices made with this process include a two-qubit quantum processor yielding T2* of up to 20 µs and 99.6% two-qubit gate fidelity [1], the first online two spin qubit processor [2], and a universally controlled six spin qubit quantum processor [3].

[1] Xue et al., Nature 601, 343 (2022).

[2] https://www.quantum-inspire.com/

[3] Philips et al., Nature 609, 919 (2022).

Publication: 1.Philips, S. G. J. et al. Universal control of a six-qubit quantum processor in silicon. Nature 609, 919–924 (2022).<br>2.Wuetz, B. P. et al. Reducing charge noise in quantum dots by using thin silicon quantum wells. at http://arxiv.org/abs/2209.07242 (2022).

Presenters

  • Larysa Tryputen

    TNO, Qutech, Netherlands Organisation for Applied Scientific Research (TNO), QuTech and Netherlands Organization for Applied Scientific Research (TNO), Delft, The Netherlands, TNO, TNO/QuTech, TNO Netherlands Organization for Applied Scientific Research

Authors

  • Sergey V Amitonov

    TNO, Qutech, QuTech and TNO, Stieltjesweg 1, 2628 CK Delft, The Netherlands, QuTech and Netherlands Organization for Applied Scientific Research (TNO), Delft, The Netherlands, TNO, QuTech, TNO, TNO/QuTech

  • Larysa Tryputen

    TNO, Qutech, Netherlands Organisation for Applied Scientific Research (TNO), QuTech and Netherlands Organization for Applied Scientific Research (TNO), Delft, The Netherlands, TNO, TNO/QuTech, TNO Netherlands Organization for Applied Scientific Research

  • Amir Sammak

    TNO, Qutech, QuTech and TNO, Stieltjesweg 1, 2628 CK Delft, The Netherlands, Netherlands Organisation for Applied Scientific Research (TNO), QuTech and Netherlands Organization for Applied Scientific Research (TNO), Delft, The Netherlands, TNO, QuTech, TNO, Netherlands Organization for Applied Scientific Research (TNO), QuTech and Netherlands Organisation for Applied Scientific Research (TNO), Stieltjesweg 1, 2628 CK Delft, The Netherlands, TNO/QuTech

  • Saurabh Karwal

    TNO, Qutech, Netherlands Organisation for Applied Scientific Research (TNO), TNO/QuTech

  • Önder Gül

    TNO, Qutech, TNO, QuTech

  • Yoram Vos

    TNO, Qutech, TNO, QuTech

  • Tumi Makinwa

    TNO/Qutech, TNO, Qutech

  • Rick N Wasserman

    TNO, QuTech

  • Delphine B Brousse

    TNO, QuTech

  • David J Michalak

    TNO/QuTech, TNO, QuTech

  • Nodar Samkharadze

    TNO, Qutech, TNO, QuTech

  • Giordano Scappucci

    QuTech and Kavli Institute of Nanoscience, TU Delft, P.O. Box 5046, 2600 GA Delft, The Netherlands, Delft University of Technology, QuTech and the Kavli Institute of Nanoscience, Delft University of Technology, TU Delft QuTech, QuTech and Kavli Institute of Nanoscience, Delft University of Technology, P.O. Box 5046, 2600 GA Delft, The Netherlands

  • Lieven M Vandersypen

    Delft University of Technology, QuTech and the Kavli Institute of Nanoscience, Delft University of Technology

  • Rabah Hanfoug

    TNO, QuTech