Unraveling the charge-to-spin conversion from 2DEGs at SrTiO<sub>3</sub> based interfaces
ORAL
Abstract
The formation of two-dimensional electron gases (2DEGs), especially the ones created at the interface of two insulating oxides [1], has led to a paradigm shift in designing the next generation materials with high charge-to-spin conversion efficiency, θCS for spintronics based memory devices. Here, we gain insight into the θCS at the 2DEGs, created on two distinct types of SrTiO3/amorphous insulator, namely the SrTiO3/AlN and SrTiO3/Al2O3, respectively. The underlying mechanism of the contribution of oxygen vacancy that directly correlates with the θCS has been overlooked in these two distinct amorphous insulators, so far. We unravel the directionality of spin-torques by angular dependent ST-FMR measurements [2]. The resultant θCS/t , where t is the thickness of the 2DEG, is estimated to be 0.244 nm-1 and 0.101 nm-1 for the SrTiO3/AlN and SrTiO3/ Al2O3 systems, respectively, and they are strikingly comparable to their crystalline counterparts. Furthermore, we also observe a large direct current modulation of resonance linewidth in SrTiO3/AlN samples, confirming its high θCS and supporting us to propose an oxygen-vacancy-enabled charge-to-spin conversion.
[1] A. Ohtomo, and H. Y. Hwang, Nature 427, 423 (2004).
[2] U. Shashank et. al., Appl. Phys. Lett. 118, 252406 (2021).
[1] A. Ohtomo, and H. Y. Hwang, Nature 427, 423 (2004).
[2] U. Shashank et. al., Appl. Phys. Lett. 118, 252406 (2021).
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Publication: U. Shashank et. al., "Room temperature charge-to-spin conversion from 2DEGs at SrTiO3 based interfaces", submitted to RRL-Rapid Research Letters, Wiley.
Presenters
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Utkarsh Shashank
Kyushu Institute of Technology
Authors
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Utkarsh Shashank
Kyushu Institute of Technology
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Angshuman Deka
Purdue University, USA
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Chen Ye
Nanyang Technological University, Singapore
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Surbhi Gupta
National Institute of Education, Nanyang Technological University, Singapore
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Rohit Medwal
Indian Institute of Technology, Kanpur, India
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Rajdeep S Rawat
Nanyang Technological University, Singapore
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Hironori Asada
Yamaguchi University, Japan
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X. Renshaw Wang
Nanyang Technological University, Singapore
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Yasuhiro Fukuma
Kyushu Institute of Technology, Japan