Gate Control of Spin-Layer-Locking FETs and Application to Monolayer LuIO
ORAL
Abstract
A recent 2D spinFET concept proposes to switch electrostatically between two separate sublayers with strong and opposite intrinsic Rashba effects, exploiting the spin-layer-locking mechanism in centrosymmetric materials with local dipole fields. In this talk, I will discuss a novel monolayer material within this family, lutetium oxide iodide (LuIO), that we identified with first-principles simulations. It displays one of the largest Rashba effects among 2D materials (up to kR = 0.08 Å–1), leading to a π/2 rotation of the spins over just 1 nm. The monolayer was predicted to be exfoliable from its experimentally known 3D bulk counterpart, with a binding energy lower than graphene. I will present our characterisation and our simulations of the interplay between the two gate-controlled parameters for such devices: doping and spin channel selection. Finally, I will discuss how the ability to split the spin channels in energy diminishes with doping, leading to specific gate-operation guidelines that can apply to all devices based on spin-layer locking.
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Publication: R. Zhang*, A. Marrazzo*, M. J. Verstraete, N. Marzari and T. Sohier, Nano Letters 21, 18, 7631–7636 (2021), https://doi.org/10.1021/acs.nanolett.1c02322<br>
Presenters
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Antimo Marrazzo
University of Trieste
Authors
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Antimo Marrazzo
University of Trieste
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Rong Zhang
École polytechnique fédérale de Lausanne
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Matthieu J Verstraete
University of Liege
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Nicola Marzari
Ecole Polytechnique Federale de Lausanne, Theory and Simulation of Materials (THEOS) and National Centre for Computational Design and Discovery of Novel Materials (MARVEL), École Polytechnique Fédérale de Lausanne
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Thibault Sohier
University of Liège, University of Liege