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A sparse quantum dot crossbar with sublinear scaling of interconnects at cryogenic temperature

ORAL

Abstract

A practical spin-based quantum computer will require millions of qubits that operate at cryogenic temperature and interface to room temperature with only a few electrical wires. Sublinear scaling of interconnects is also required for a high-throughput fabrication-measurement cycle of quantum devices. We demonstrate a 36x36 gate electrode crossbar that supports 648 narrow-channel field effect transistors (FET) for gate-defined quantum dots and enables a quadratic increase in quantum dot device count with a linear increase in control lines. The multi-gate FET are fabricated on industrial 28Si-MOS stacks and integrate two tunable tunnel barriers per device, with interleaved ohmic contacts and cryo-CMOS control circuitry to measure each device independently from all others. Electrical characterisation at 1.7 K of a grid with geometry variations demonstrates 100% device yield and shows a decreasing threshold voltage for narrow channel devices. Statistical data obtained in this way provide means for device optimisation by design as a stepping stone towards large quantum dot spin-qubit arrays.

Presenters

  • Peter L Bavdaz

    Delft University of Technology

Authors

  • Peter L Bavdaz

    Delft University of Technology

  • Harmen G Eenink

    Delft University of Technology

  • Job van Staveren

    Delft University of Technology

  • Mario Lodari

    Delft University of Technology, QuTech and Kavli Institute of Nanoscience, TU Delft, P.O. Box 5046, 2600 GA Delft, The Netherlands, QuTech and Kavli Institute of Nanoscience, Delft University of Technology

  • Fabio Sebastiano

    Delft University of Technology

  • Menno Veldhorst

    Delft University of Technology

  • Giordano Scappucci

    Delft University of Technology, QuTech and Kavli Institute of Nanoscience, TU Delft, P.O. Box 5046, 2600 GA Delft, The Netherlands, QuTech and Kavli Institute of Nanoscience, Delft University of Technology

  • Carmina G Almudever

    Technical University of Valencia