APS Logo

Real-space visualization of temperature- and layer-dependent susceptibility in the layered antiferromagnet CrSBr

ORAL

Abstract

Layered magnetic materials have recently garnered substantial interest as platforms for realizing tunable magnetic devices and studying fundamental two-dimensional (2D) magnetic properties. A growing body of research on chromium-based van der Waals (vdW) materials demonstrates the existence magnetism in 2D films down to single atomic layers. Among these, CrSBr has emerged as an air-stable layered antiferromagnetic (AFM) semiconductor with a high transition temperature (TN ≈ 132 K) and gate-tunable magnetic ordering. However, the direct real-space visualization and temperature evolution of magnetic domains in CrSBr remains unexplored, and requires a sensitive local probe. To achieve this, we conducted a variable-temperature magnetic force microscopy (MFM) study under ultrahigh vacuum (UHV) conditions, revealing incipient magnetism well above TN associated with the onset of in-plane magnetic correlations which eventually give way to layer-dependent magnetization in the low-temperature AFM phase (T < TN). In addition, we observe temperature-dependent magnetic susceptibility and switching with a high degree of spatial inhomogeneity arising, in part, from the parity of the underlying layer number.

Presenters

  • Daniel J Rizzo

    Columbia University

Authors

  • Daniel J Rizzo

    Columbia University

  • Alexander S McLeod

    Columbia Univ, Columbia University

  • Caitlin Carnahan

    Carnegie Mellon University, Carnegie Mellon Univ

  • Avalon H Dismukes

    Columbia University

  • Ren A Wiscons

    Amherst College

  • Evan J Telford

    Columbia University, Columbia Univ

  • Yinan Dong

    Columbia University

  • Abhay N Pasupathy

    Columbia University, Brookhaven National Laboratory & Columbia University

  • Xavier Roy

    Columbia University

  • Di Xiao

    University of Washington, Department of Physics, University of Washington, Seattle, WA, USA. Department of Materials Science and Engineering, University of Washington, Seattle, WA, USA, University of Washington, Seattle

  • Dmitri N Basov

    Columbia University