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Voltage-controlled Néel vector rotation in zero magnetic field in high-T<sub>N</sub> magnetoelectric thin films

POSTER

Abstract

Multi-functional thin films of boron (B) doped Cr2O3 exhibit voltage-controlled and nonvolatile Néel vector reorientation in the absence of a magnetic field, H. Toggling of antiferromagnetic states is demonstrated in prototype spin Hall magnetoresistance device structures at CMOS compatible temperatures between 300 and 400 K. The boundary magnetization associated with the Néel vector orientation serves as state variable which is read via magnetoresistive detection in a Pt Hall bar adjacent to the B:Cr2O3 film. Various characterization techniques support that voltage controlled, nonvolatile Néel vector rotation takes place at high-temperature in H = 0. Theoretical modeling estimates switching speeds of about 100 ps making B:Cr2O3 a promising multifunctional single-phase material for energy efficient nonvolatile CMOS compatible memory applications.

Publication: Voltage controlled Néel vector rotation in zero magnetic field<br>Ather Mahmood Will Echtenkamp, Mike Street, Jun-Lei Wang, Shi Cao, Takashi Komesu, Peter A. Dowben, Pratyush Buragohain, Haidong Lu, Alexei Gruverman, Arun Parthasarathy, Shaloo Rakheja, Christian Binek. Nat Commun 12, 1674 (2021).

Presenters

  • Ather Mahmood

    University of Nebraska - Lincoln

Authors

  • Syed Qamar Abbas Shah

    University of Nebraska - Lincoln

  • Ather Mahmood

    University of Nebraska - Lincoln

  • Will Echtenkamp

    University of Nebraska - Lincoln

  • Junlei Wang

    University of Nebraska - Lincoln

  • Mike Street

    Seagate Technology

  • Takashi Komesu

    University of Nebraska - Lincoln

  • Peter A Dowben

    University of Nebraska - Lincoln, Department of Physics and Astronomy, University of Nebraska - Lincoln, Department of Physics and Astronomy; University of Nebraska-Lincoln, Department of Physics and Astronomy, Jorgensen Hall, University of Nebraska, NE 68588, USA, Department of Physics and Astronomy, University of Nebraska, Lincoln

  • Pratyush P Buragohain

    University of Nebraska - Lincoln

  • Haidong Lu

    University of Nebraska Lincoln

  • Alexei Gruverman

    University of Nebraska - Lincoln

  • Arun Parthasarathy

    NYU Tandon Sch of Engr

  • Shaloo Rakheja

    University of Illinois at Urbana–Champaign, University of Illinois at Urbana-Champaign

  • Christian Binek

    University of Nebraska - Lincoln