Uniform, crack-free colloidal deposition with surface wettability adjusting

Deposition of colloidal nanoink is a useful method for inkjet printing. Typically, evaporation on micropillar array leads droplet to be pinned and makes final deposition pattern to have various polygonal shape which has strength for industrial application. But those micropatterns additionally make surface to have hydrophobic properties and keep height difference between center and edge of deposition pattern until the end of evaporation. This non-uniform height induces physical instability and eventually makes deposited film destruction. Thus, we have used plasma treatment to control the chemical characteristic and induce spreading force beyond micropillars. We finally intend to improve the uniformity of binary colloidal deposition with crack-free pattern.

 

 

 

Keyword: colloidal mixture, binary particle, X-ray tomography, droplet evaporation