Intercalation-Enhanced Light-Matter Interactions in MoS<sub>2</sub>: Comparing Copper to Tin
ORAL
Abstract
Intercalation spans a vast space for modifying the properties of materials and provides a laboratory for studying fundamental chemical and physical phenomena on the atomic scale. Here, we present the cases of zero-valent copper and tin intercalation in MoS2 as employed by the Koski method. We show that in both cases the host MoS2 remains semiconducting even at the limit of high metal content. The spectrally broad and high cross section of the metals enhances the interaction of intercalated MoS2 with light and its photodetection capabilities. This results in highly responsive devices at a broad spectral range. However, the two cases fall under different enhancement mechanisms, representing the difference in the atomic species properties as well as the packing structure and density of the intercalants within the van der Waals gap: while tin organizes in small clusters, copper intercalants organize in continuous, extended layers between those of MoS2. While copper features a strong plasmon resonance, tin clusters tend to ionize by contributing electrons to the conduction band of the MoS2 hybrid. We also compare the spectral response to the two hybrids, showing a redshift towards the infrared in the photoconductivity of Sn:MoS2.
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Publication: Stern, C., Twitto, A., Snitkoff, R. Z., Fleger, Y., Saha, S., Boddapati, L., Jain, A., Wang, M., Koski, K. J., Deepak, F. L., Ramasubramaniam, A., Naveh, D., Enhancing Light–Matter Interactions in MoS2 by Copper Intercalation. Adv. Mater. 2021, 33, 2008779. https://doi.org/10.1002/adma.202008779
Presenters
Doron Naveh
Bar Ilan University, Bar-Ilan University
Authors
Doron Naveh
Bar Ilan University, Bar-Ilan University
Chen Stern
Faculty of Engineering, Bar-Ilan University, Bar Ilan University
Sabyasachi Saha
Nanostructured Materials Group, International Iberian Nanotechnology Laboratory Portugal, Defence Metallurgical Research Laboratory (DMRL)
Francis L Deepak
Nanostructured Materials Group, International Iberian Nanotechnology Laboratory, Portugal, International Iberian Nanotechnology Laboratory
Akash Jain
University of Massachusetts, Amherst, University of Massachusetts Amherst
Kristie J Koski
University of California, Davis
Avraham Twitto
Faculty of Engineering, Bar-Ilan University, Bar Ilan University