STM study of the atomic and electronic structure of a single-layer Kondo lattice CePt<sub>6</sub>/Pt(111)
ORAL
Abstract
While bulk CePt5 shows antiferromagnetic order below 1 K, a multi-layered thin film of CePt5 grown on a Pt(111) substrate exhibits heavy-fermion behavior below 20 K[1]. However, the growth of single layer CePt5 has been controversial as summarized in Ref.[2] and spectroscopic studies for the electronic states of the single layer are still lacking. In this work, we study the structure and electronic states of 1 unit layer (u.l.) of a Ce-Pt intermetallic compound on Pt(111) using scanning tunneling microscopy/spectroscopy (STM/STS)[3]. By depositing Ce atoms onto Pt(111) and subsequent annealing, an ordered (2×2) structure was observed, which is reproduced by a structural model of 1 u.l. CePt6/Pt(111) consisting of a topmost Pt4 layer and an underneath CePt2 layer. By measuring STS spectra and quasiparticle interference, we found that an onset energy of the surface state observed on Pt(111) shifts downward on the surface Pt4 layer of the 1 u.l. CePt6 due to charge transfer from the CePt2 layer. We discuss possible two-dimensional coherent Kondo effect with the observed STS spectra on the 1 u.l. CePt6.
[1] M. Klein et al., Phys. Rev. Lett. 106, 186407 (2011)
[2] J. Kemmer et al., Phys. Rev. B 90, 195401 (2014).
[3] K. Ienaga et al., Phys. Rev. B (accepted)
[1] M. Klein et al., Phys. Rev. Lett. 106, 186407 (2011)
[2] J. Kemmer et al., Phys. Rev. B 90, 195401 (2014).
[3] K. Ienaga et al., Phys. Rev. B (accepted)
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Publication: Koichiro Ienaga, Sunghun Kim, Toshio Miyamachi, and Fumio Komori, Phys. Rev. B (accepted)
Presenters
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Koichiro Ienaga
Tokyo Institute of Technology
Authors
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Koichiro Ienaga
Tokyo Institute of Technology
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Sunghun Kim
Department of Physics, Korea Advanced Institute of Science and Technology, Daejeon 34141, Republic of Korea, Korea Advanced Institute of Science and Technology
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Toshio Miyamachi
Institute of Materials and Systems for Sustainability, Nagoya University
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Fumio Komori
Institute of Industrial Science, The University of Tokyo