Engineering of Interlayer Electronic and Mechanical Coupling in Bilayer MoS<sub>2</sub> by Applying Gigapascal High Pressure
ORAL
Abstract
Interlayer electronic and mechanical coupling plays a critical role in determining the novel electronic properties of van der Waal (vdW) bilayers. In particular, the coupling strength is determined by the stacking configuration and the interlayer spacing. While the former has been well established, the influence of interlayer spacing remains largely unexplored. Here, by measuring the optical absorption and Raman mode of the bilayer MoS2 in a high-pressure diamond anvil cell, we quantitatively determined the coupling strength of the electronic band and phonon mode. All experimental results are supported by theoretical calculations. Our work has confirmed the great potential in tailoring vdW bilayers through gigapascal high pressure.
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Presenters
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Wei-Ting Hsu
Natl Tsing Hua Univ
Authors
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Wei-Ting Hsu
Natl Tsing Hua Univ
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Jiamin Quan
University of Texas at Austin
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Joshua A Leveillee
University of Texas at Austin
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Chi-Ruei Pan
Academia Sinica
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Mei-Yin Chou
Institute of Atomic and Molecular Sciences, Academia Sinica, Taiwan, Academia Sinica, Taiwan, Academia Sinica
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Wen-Hao Chang
Academia Sinica
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Xiaoqin (Elaine) Li
University of Texas at Austin
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Feliciano Giustino
University of Texas at Austin, University of Texas
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Jung-Fu Lin
University of Texas at Austin, Department of Geological Sciences, Jackson School of Geosciences, The University of Texas at Austin, Austin, TX 78712, USA
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Chih-Kang Shih
University of Texas at Austin