High-Resolution Nonlinear Imaging
POSTER
Abstract
An interferometric optical system for writing arbitrary 2-D patterns on nonlinearly absorbing substrates at a resolution better than normally allowed by the Rayleigh criterion is studied. The manipulation of these patterns can be used to create arbitrary 1-D and even 2-D images at a resolution better than the Rayleigh limit, due to the nonlinear nature of our interference. Both computer simulations and experimental verifications are performed. Computer simulations of this process will account for experimental limitations, such as difraction. Details of the system along with preliminary results will be presented.
Presenters
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Mateo Murillo
Adelphi University
Authors
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Mateo Murillo
Adelphi University
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Zahin Ritee
Adelphi University
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Sean J Bentley
Adelphi University